The Surface Chemistry of Thin Film Atomic Layer Deposition (ALD) Processes for Electronic Device Manufacturing

技术支持：该项目的目标是在分子水平上更好地理解与半导体和相关材料的原子层沉积（ALD）相关的化学反应。该项目采用表面科学方法，将在现实条件下运行的反应器中沉积过程的动力学研究与使用表面敏感技术相结合，如X射线光电子能谱（XPS）、红外光谱（IR）、俄歇电子能谱（AES）、低能离子散射（LEIS）和程序升温脱附（TPD）。最初的重点将是研究金属氮化物扩散阻挡层和铜金属互连的沉积工艺。具体的问题将在所涉及的反应的动力学和机制，以及在与所得薄膜的组成和形态方面得到解决。所获得的信息将直接用于ALD工艺的设计，该工艺在温和的条件下操作，并存款化学计量的、具有良好密度、低电阻和光滑表面的纯膜。非技术：虽然ALD在半导体路线图上，但ALD领域在很大程度上是经验性的。显然需要对ALD的表面化学进行更多的基础研究。该项目是跨学科的，为学生提供连接化学，材料科学和物理学的培训。研究结果也可以很好地用于教育目的，在本科生和研究生班说明动力学原理。重点将放在鼓励代表性不足的群体的学生参与，并建立国际合作。

Technical: The objective of this project is to develop a better molecular-level understanding of chemical reactions associated with atomic layer deposition (ALD) of semiconductor and related materials. The project uses a surface-science approach, combining kinetic studies of deposition processes in reactors operating under realistic conditions with the use of surface-sensitive techniques such as x-ray photoemission spectroscopy (XPS), infrared spectroscopy (IR), Auger electron spectroscopy (AES), low-energy ion scattering (LEIS), and temperature programmed desorption (TPD). The initial focus will be on the study of processes for the deposition of metal nitride diffusion barriers and copper metal interconnects. Specific questions will be addressed in terms of the kinetics and mechanisms of the reactions involved as well as in connection with the composition and morphology of the resulting films. Information gained will be directed to the design of ALD processes that operate under mild conditions and deposit stoichiometric, pure films with good density, low resistance, and smooth surfaces. Non-technical: Although ALD is on the Semiconductor Roadmap, the ALD field is largely empirical. There is a clear need for more basic studies of the surface chemistry of ALD. The project is interdisciplinary, providing students with training that bridges chemistry, materials science, and physics. The research results can also be of great use for educational purposes, to illustrate kinetic principles in undergraduate and graduate classes. Emphasis will be placed on encouraging student participation from underrepresented groups, and on forging international collaborations.