NER: Fabrication of 3-D Nanscale Structures of Arbitrary Shape by Single-Step E-beam Grayscale Lithographic Process

该项目的智力优势集中在探索开发一种新的电子束(电子束)光刻技术的可行性，该技术能够以系统和可重复的方式制造任意形状的纳米级三维表面。该技术将包括最先进的电子束光刻和等离子刻蚀工艺，以及空间电子束剂量控制方案，以实现所需的轮廓。这一研究项目的更广泛影响将是深远的。新的光刻工具(将在本项目和后续项目中开发)将使设备制造商能够制造出以前不可能实现的新颖的3-D纳米级设备元素。这项拟议的工作将培训研究生挑战需求迅速增长的新技术，并发展纳米制造研究的尖端工具和技术方面的技能。非洲裔美国女研究生有望通过这种独特的跨学科研究和教育方法大大受益，这是更传统的课程所不提供的。最后，从这项研究中获得的知识将加强现有的纳米科学和技术课程，并为新课程--纳米系统的制造提供基础。

The intellectual merit of this project is focused on exploring the feasibility of developing a new electron-beam (e-beam) lithography technique capable of fabricating nanoscale 3-D surfaces of arbitrary shape in a systematic and reproducible manner. The technique will include state-of-the art e-beam lithographic and plasma etching processes as well as a spatial e-beam dose control scheme to achieve the desired contour. The broader impacts of this research project will be far-reaching. The new lithographic tool (to be developed in this and subsequentprojects)will enable device makers to fashion novel 3-D nanoscale device elements not previously possible. This proposed work will train graduate students in challenging new technologies that have a rapidly growing demand as well as develop skills in cutting-edge tools and techniques for nanofabrication researches. An African American female graduate student is expected to benefit substantially through this unique interdisciplinary approach to research and education not offered in more traditional programs. Finally, the knowledge gained from this research will enhance the existing courses on nanoscience and technology as well as provide a basis for a new course, Fabrication of Nano Systems.