19th Annual Workshop on Interconnections within High Speed Digital Systems. To be Held May 18-21, 2008 in Santa Fe, NM.

智力优势：第19届IEEE/LEOS高速数字系统互连年度研讨会的目的是审查新兴和未来计算机和通信系统的互连要求；并在元件、封装和系统层面传播最先进的光学和电气互连技术的信息。研讨会包括16个来自行业从业者和大学研究人员的特邀讲座，以及3个全体讲座，电气和光子互连方面的专家参加了研讨会。此外，与会者分成较小的小组，就共同的技术问题进行协作，选择这些问题是为了阐明系统性能和成本权衡。更广泛的影响：讲习班的跨学科和互动形式为初级研究人员参与者提供了极大的教育益处，培训他们提供下一代高性能互联解决方案，并学会在团队环境中创造性地思考。在讨论讲习班问题期间，初级研究人员和实地专家进行了非常密切的合作；鼓励初级研究人员在讲习班上通过(同行评审的)海报展示他们的工作。鼓励初级研究人员的参与也有助于为研讨会带来地理和技术上的多样性。

Intellectual Merit: The purpose of the 19th Annual IEEE/LEOS Workshop on Interconnections within High-Speed Digital Systems is to examine the interconnection requirements of emerging and future computer and communications systems; and to disseminate information about state-of-the art optical and electrical interconnectiontechnologies at the component, packaging, and systems level. The workshop consists of 16 invited talks from industry practioners and university researchers plus three plenary talks, and is attended by experts in electrical and photonic interconnects. In addition, the attendees break into smaller groups to collaborate on a common technology problem, selected to elucidate system performance and cost tradeoffs. Broader Impacts: The interdisciplinary and interactiveformat of the Workshop offers a great educational benefit to junior researcher participants, training them to provide the next generation of high performance interconnection solutions and to learn to think creatively in a team environment. During discussions of the workshop problem, junior researchers and experts in the field collaborate very closely; and junior researchers are encouraged to show their work through a (peer-reviewed) poster session at the workshop. Encouraging participation from junior researchers also helps to bring diversity, both geographic as well as technical, to the workshop.