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SBIR Phase I: Development of Chemical Vapor Deposition of Shape Memory Alloy TiNi Thin Films for Complex Forms

SBIR Phase I: Development of Chemical Vapor Deposition of Shape Memory Alloy TiNi Thin Films for Complex Forms
SBIR 第一阶段:复杂形状形状记忆合金 TiNi 薄膜化学气相沉积的开发
批准号:
1014097
负责人:
Peter Jardine
金额:
$15.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2010
资助国家:
美国
项目状态:
已结题
起止时间:
2010-07-01 至 2010-12-31

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中文摘要
翻译
这个小型企业创新研究(SBIR)第一阶段项目寻求开发一种新的方法,用于沉积大规模、均匀和复杂的形状记忆合金部件。目前的沉积方法不能产生商业上相关部件所需的均匀化学成分或三维几何复杂性。此外,目前制造TiNi的成本太高,限制了商业接受度。TiNi是一种关键的薄膜形状记忆合金。TiNi的化学气相沉积(CVD)提供了一种廉价制造几何复杂零件的方法。在第一阶段,我们的团队将对一种新的CVD工艺进行表征,并从化学成分、化学均匀度和污染水平方面对所产生的制造部件进行表征。该项目更广泛的影响/商业潜力是开发了一种新的制造方法,通过提供一种在批量生产过程中制造高度一致、均匀的物品的方法,允许大幅降低薄膜TiNi片产品、支架和开孔泡沫的成本。对于几何形状高度复杂的形状,例如高孔率开孔泡沫,这种CVD工艺是一种可行的制造技术。这一工艺的成功开发将给薄膜TiNi行业带来革命性的变化,最终向市场提供具有所需质量和批次一致性的产品,以获得广泛的商业认可。
英文摘要
This Small Business Innovation Research (SBIR) Phase I project seeks to develop an new methodology for the deposition of large-scale uniform and complex shape memory alloy parts. Current deposition methods cannot generate the uniform chemical composition, or the three dimensional geometric complexity, that is required for commercially relevant parts. In addition, the cost of current methods to manufacture TiNi, a key thin film shape memory alloy, is too high, limiting commercial acceptance. Chemical vapor deposition (CVD) of TiNi offers a means to manufacture geometrically complex parts inexpensively. In Phase I, our team will characterize a novel CVD process and characterize the resultant manufactured parts in terms of chemical composition, chemical uniformity, and contamination levels. This data will enable a transition to manufacturing of commercial shape memory devices in Phase II.The broader impact/commercial potential of this project is the development of a new fabrication methodology that will allow for a dramatic reduction in the cost of thin film TiNi sheet products, stents, and open celled foams, by providing a means to manufacture highly consistent, uniform articles in a batch production process. For highly geometrically complex forms, such as high porosity open celled foams, this CVD process is an enabling manufacturing technology. Successful development of this process will revolutionize the thin film TiNi industry by finally supplying products to the marketplace with the required quality and batch-to-batch consistency for wide commercial acceptance.
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