MRI: Acquisition of a mask aligner and a pattern generation system for nanoscale science and device research
MRI: Acquisition of a mask aligner and a pattern generation system for nanoscale science and device research
批准号:
1040435
负责人:
Tsung-Cheng Shen
金额:
$10.11万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2011
资助国家:
美国
项目状态:
已结题
起止时间:
2011-01-01 至 2013-12-31
中文摘要
本提案的目的是获得光刻掩模对准器(从毫米到0.6微米尺度)和纳米图案生成系统,以附在现有的扫描电子显微镜的子100纳米电子束光刻(EBL)。 微制造最初是为硅器件和集成电路而开发的,现已成为探索新材料(如石墨烯和超材料)的特性以及创建具有新功能的器件(如传感器和纳米/微机电系统(N/MEMS))的必要技术。的纳米器件实验室(NDL),这两个增加将使,第一次在USU,新材料的特性和创造新的设备,为一些跨学科的研究项目。一旦设备建立起来,并从这些目前正在进行的项目突出的能力,预计更多的研究人员将使用NDL探索无限的微/纳米器件的世界。更广泛的影响获得所要求的系统将是一个重大的研究基础设施的改进,为USU,无疑将帮助USU招聘教师和学生感兴趣的纳米科学和工程。 在NDL工作的学生,包括代表性不足的群体,将接受微制造基础知识的宝贵培训,使他们能够在国家纳米制造设施中更有效地开展研究。 NDL参与了开放式和课堂演示,并计划进一步开展涉及微加工的活动。 NDL将积极寻求更多的工业合作伙伴关系,不仅将成功的原型商业化,而且刺激关注社会需求的研究。
英文摘要
The objective of this proposal is to acquire a mask aligner for photolithography (from mm to 0.6 micrometer scale) and a nanometer pattern generation system to be attached to the existing SEM for sub-100 nm e-beam lithography (EBL). Microfabrication, originally developed for silicon-devices and integrated circuits, has become an essential technology to explore properties of new materials, such as graphene and metamaterials, and create devices with novel functionalities, such as sensors and nano/microelectrical-mechanical-systems (N/MEMS).Intellectual MeritCombined with the existing equipment at Utah State University?s Nanoscale Device Laboratory (NDL), these two additions will enable, for the first time at USU, the characterization of new materials and the creation of novel devices for a number of cross-disciplinary research projects. Once the equipment is set up and capabilities are highlighted from these currently underway projects, it is expected that more researchers will use NDL to explore the unlimited world of micro/nanoscale devices.Broader ImpactsAcquiring the requested system will be a significant research infrastructure improvement for USU and will undoubtedly help USU to recruit faculty and students interested in nanoscale science and engineering. Students, including underrepresented groups, working at NDL will receive invaluable training in the basics of microfabrication allowing them to carry out research more efficiently at national nanofabrication facilities. NDL has been involved in open-house and class-demonstrations, and further activities involving microfabrication are planned. More industrial partnerships will be actively pursued at NDL not only to commercialize successful prototypes but to stimulate research focusing on the needs of society.
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批准号:1626344
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项目类别:Standard Grant
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资助金额:$14.49万
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负责人:Tsung-Cheng Shen
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依托单位:
海外基金