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Experiences in Applied Low Temperature Plasmas: Student Travel Support to Attend the 2011 American Vacuum Society International Symposium in Nashville, TN, 10/30-11/4/2011.

Experiences in Applied Low Temperature Plasmas: Student Travel Support to Attend the 2011 American Vacuum Society International Symposium in Nashville, TN, 10/30-11/4/2011.
应用低温等离子体的经验:学生旅行支持参加 2011 年 10 月 30 日至 11 月 4 日在田纳西州纳什维尔举行的 2011 年美国真空协会国际研讨会。
批准号:
1129395
负责人:
Matthew Goeckner
金额:
$0.5万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2011
资助国家:
美国
项目状态:
已结题
起止时间:
2011-10-01 至 2012-09-30

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中文摘要
翻译
1129395 Goeckner这项建议是为了在田纳西州纳什维尔举行的2011年美国真空学会国际研讨会上支持学生参与等离子体科学和技术领域的部分活动。AVS侧重于表面科学、材料科学、真空科学与低温等离子体的物理和化学、放电和等离子体化学及其技术应用的科学和技术方面。讨论的基本主题包括等离子体诊断、离子和电子分布函数,以及动力学、细胞内粒子(PIC)和流体等离子体建模。应用领域包括材料的等离子体处理、等离子体与表面的相互作用、激光、照明、等离子体医学、等离子体辅助燃烧等。AVS具有鼓励和促进学生参与的强大传统。AVS有着令人羡慕的声誉,因为它是社区许多领导成员以研究生身份展示他们的研究成果的第一次会议。AVS的学生参与对年轻科学家和工程师的专业发展尤为重要。智力优势:AVS是应用低温等离子体(LTPS)科学和技术领域的领先国际会议。从照明和激光到等离子体材料处理和等离子体医学,该会议首次就LTPS研究的世界领先发展进行了陈述。被邀请的演讲者代表世界-S在LTPS领导工业界和学术界的科学家。今年的会议预计将延续介绍等离子体物理和工程最新技术的传统。广泛的影响:这次研讨会拓宽了研究生的视野。更广泛的影响包括让美国年轻科学家有机会参加他们所在领域最重要的国际会议之一。他们将有机会第一手观察该领域的科学和文化多样性,并与他们的国际同行建立有望成为职业生涯的合作伙伴关系。组织者将特别努力支持女性和代表性不足的少数族裔研究生。
英文摘要
1129395GoecknerThis proposal is for partial support of student participation in the plasma science and technology fields in the 2011 American Vacuum Society International Symposium in Nashville, TN. AVS focuses on scientific and technological aspects of surface science, materials science, vacuum science with the physics and chemistry of low temperature plasmas, electric discharges and plasma chemistry, and their technological applications. Fundamental topics addressed include plasma diagnostics, ion and electron distribution functions, as well as kinetic, particle-in-cell (PIC) and fluid plasma modeling. Applications include plasma processing of materials, plasma interaction with surfaces, lasers, lighting, plasma medicine, plasma aided combustion among others.The AVS has a strong tradition of encouraging and promoting student participation. The AVS has an enviable reputation of being the first conference that many of the leading members of the community presented their research results as graduate students. Student participation in AVS is particularly important to the professional development of young scientists and engineers.Intellectual Merit: AVS is the leading international conference in the science and technology of applied low temperature plasmas (LTPs). The conference has been the venue of the first presentations on world leading developments in investigations of LTPs, from lighting and lasers, to plasma materials processing and plasma-medicine. The invited speakers represent the world?s leading industrial and academic scientists in LTPs. This year's conference is expected to continue the tradition of presenting on the state of the art in plasma physics and engineering.Broader Impact: This symposium broadens the perspectives of graduate students. The broader impacts include the opportunity for young U.S. scientists to attend one of the most important international conferences in their field. They will have the opportunity to observe firsthand the scientific and cultural diversity of the field, and establish what will hopefully be career long collaborations with their international counterparts. The organizers will make a special effort to support women and underrepresented minority graduate students.
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