MRI: Acquisition of an Electron Beam Lithography System for the NCSU Nanofabrication Facility

目的：这项建议是一个新的电子束光刻和成像系统，以增加在NC州立大学的纳米制造能力，为广泛的应用和用户。智力优势：这项收购建议预计将导致高性能的纳米器件的纳米电子，光电子，纳米流体生物传感器和纳米间隙传感器。电子束光刻系统和成像系统将有能力在6英寸晶片上达到10 nm的分辨率。PI管理微电子中心，这个新工具将位于那里。 这一新工具将得到广泛使用，40多名教职员工将积极参与这一工具所能实现的研究;本提案中描述了20个具有高度影响力的具体研究项目。这里提出的新仪器将催化和加速纳米科学在各种技术领域的跨学科研究。更广泛的影响：所要求的仪器将服务于4所学院和10个部门在北卡罗来纳州，因此预计将服务于大量的教师和他们各自的学生。 由所要求的系统启用的研究将对NC State的研究生和本科生研究和培训产生重大影响，该仪器将被集成到几个实验室课程中。外展活动包括参与当地的一个HBCU-邵氏大学，以及为少数民族学生提供暑期实习机会，提供实践教育和研究培训。

Objective: This proposal is for a new electron beam lithography and imaging system to augment the nanoscale fabrication capabilities at NC State University for a wide range of applications and users. Intellectual Merit: This acquisition proposal is expected to lead to high-performance nano-devices for nanoelectronics, opto-electronics, nanofluidic bio-sensors, and nanogap sensors. The electron beam lithography system and imaging system will have the capability to reach the resolutions down to 10 nm on six inch wafers. The PI manages the Microelectronics center, where this new tool will be located. The new tool will be widely used, with over 40 faculty members actively involved in research that will be enabled by this tool; 20 specific research projects of high impact have been described in this proposal. This new instrument proposed here will catalyze and accelerate interdisciplinary research in nanoscience on a variety of technical fields.Broader Impacts: The requested instrument will serve 4 colleges and 10 departments at NC State and hence is expected to serve a large population of faculty and their respective students. The research enabled by the requested system will have significant impact in both graduate and undergraduate research and training at NC State and the instrument will be integrated into several lab courses. Outreach activities include involvement with Shaw University, a local HBCU, and summer internships for minority students providing getting hands-on education and research training.