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FMSG: BIO: Manufacturing of Molecular-Precision, Scalable 2D Material Memory Array for Future Electronics

FMSG: BIO: Manufacturing of Molecular-Precision, Scalable 2D Material Memory Array for Future Electronics
FMSG:BIO:用于未来电子产品的分子精度、可扩展 2D 材料存储阵列的制造
批准号:
2229131
负责人:
Haitao Liu
金额:
$50.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2022
资助国家:
美国
项目状态:
已结题
起止时间:
2022-10-01 至 2024-09-30

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中文摘要
翻译
该项目将开发一种制造计算机内存的新方法,计算机内存是现代计算和数据存储的关键组件。目前,存储技术是由硅片制成的,这需要昂贵的仪器才能形成图案。使用这种方法来缩小存储设备的大小也越来越困难。我们的方法将利用DNA的自组装特性和二维(2D)材料来克服这一制造瓶颈。2D材料是原子薄膜,具有出色的电学性能。利用DNA的大小将创建纳米级模板来对2D材料进行图案和修改。我们的实验得到了这些系统的原子尺度理论模型的补充,以促进存储和计算应用中的存储技术。这项研究的结果将促进美国的半导体技术,并有利于美国的经济和安全。这项研究是来自三所研究密集型大学的化学家、材料科学家和电气工程师的密切合作,这三所大学分别是一所四年制大学、一所社区学院和一所历史悠久的黑人大学。该项目将扩大未被充分代表的群体在研究中的参与,并对科学和工程教育产生积极影响。该项目的目标是检验DNA纳米结构可以图案化缺陷并以分子精度将掺杂离子输送到2D材料的假设,以及这种策略可以制造高精度、低变异的突触设备。该团队将使用DNA纳米结构在单层石墨烯和二硫化钼上创建一定数量的缺陷和插入物,并使用这些修改后的2D材料来制造突触存储设备。这些设备对于实现模仿人脑的节能计算架构至关重要。将开发原子模型来理解材料和器件的行为。该项目还包括教育和劳动力发展活动,旨在突出生物、化学、物理和工程的整合,作为未来半导体设备制造的潜在职业道路。该未来制造奖得到了工程局和土木工程、机械和制造创新部的支持。该奖项反映了NSF的法定使命,并通过使用基金会的智力优势和更广泛的影响审查标准进行评估,被认为值得支持。
英文摘要
This project will develop a new approach to manufacturing computer memory, a critical component in modern computing and data storage. Currently, memory technologies are made from silicon wafers, which require expensive instruments to pattern. It is also increasingly difficult to shrink the size of the memory device using this approach. Our approach will leverage DNA’s self-assembly properties and two-dimensional (2D) materials to overcome this manufacturing bottleneck. 2D materials are atomically-thin films and have outstanding electrical properties. Leveraging DNA’s size will create nanometer-scale templates to pattern and modify 2D materials. Our experiments are complemented by atomic-scale theoretical models of these systems, to advance memory technologies in both storage and computing applications. Results from this research will advance semiconductor technology for the U.S. and benefit the nation’s economy and security. This research is a close collaboration between chemists, material scientists, and electrical engineers from three research-intensive universities, a four-year college, a community college, and a historically black university. This project will broaden participation of underrepresented groups in research and positively impact science and engineering education.The objective of this project is to test the hypothesis that DNA nanostructures can pattern defects and deliver dopant ions to 2D materials with molecular precision, and that this strategy can produce high-precision, low-variation synaptic devices. The team will use DNA nanostructures to create a defined number of defects and intercalants on single-layer graphene and molybdenum disulfide and use these modified 2D materials to fabricate synaptic memory devices. The devices are critical to enable energy-efficient computing architectures that mimic the human brain. Atomistic models will be developed to understand the material and device behaviors. The project also includes education and workforce development activities, designed to highlight the integration of biology, chemistry, physics, and engineering as a potential career path towards the future manufacturing of semiconductor devices.This Future Manufacturing award was supported by the Engineering Directorate and the Division of Civil, Mechanical, and Manufacturing Innovation.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
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DNA-mediated Surface Reactions
  • 批准号:
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