The initial formation of the interface in the metal/compound-semiconductor system
The initial formation of the interface in the metal/compound-semiconductor system
批准号:
06452335
负责人:
OSAKA Toshiaki
金额:
$4.74万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (B)
财政年份:
1994
资助国家:
日本
项目状态:
已结题
起止时间:
1994 至 1995
中文摘要
了解金属/半导体系统中界面的形成过程和原子结构对于改进其工艺非常重要。因此,虽然这种界面已经被广泛研究了几十年,但与金属/化合物-半导体系统相关的工作还很少。在这项工作中,我们报告了扫描隧道显微镜(STM)对Sn/InSb(111)A-2x2系统界面形成的初始阶段的研究。到目前为止,该系统一直是RHEED研究和DV-Xα计算的主题。然而,关于“锡在InSb(111)A-2x2表面上吸附在哪里?”的问题。在超高真空中,通过在460゚附近的窄范围内对样品进行热处理,可以重复地制备干净且定义良好的InSb(111)A-2x2衬底表面。对InSb(111)A-2x2表面的STM观察揭示了InSb(111)A-2x2表面的空位屈曲结构,这一结构已经由Bohr等人报道。例如,占据态的STM在高偏压下与In空位附近的第二层Sb的孤对相对应,在低偏压下与In最外层和Sb的第二层之间的成键轨道相对应。有时,观察到其边缘垂直于[112]或[112]方向的双向台阶。在电子计数模型的基础上,提出了一种新的阶梯结构模型。锡非周期性地吸附在InSb(111)A-2x2表面的以下三个位置上:In空位的顶部位置、第二层的Sb位置和最外层的In位置。在这些吸附位置中,In空位的顶部最容易被锡占据。
英文摘要
Understanding of the formation process and atomic structure of interfaces in the metal/semiconductor system is very important for improvements in its technology. Therefore, although such interfaces have been studied extensively for decades, little work associated with the metal/compound-semiconductor system has been carried out.In this work we report on the scanning tunneling microscopy (STM) study of the very initial stage of the interface formation in the Sn/InSb (111) A-2x2 system. So far this system has been the subject of RHEED investigation and DV-X alpha calculation. However, the question on "where is the Sn adsorbed on the InSb (111) A-2x2 surface? " has not been answered by direct methods such as STM.The clean and well-defined substrate surface of InSb (111) A-2x2 could be reproducibly prepared in UHV by annealing a sample in the narrow range near 460゚C.STM observations of the InSb (111) A-2x2 surface reveal the In-vacancy buckling structure which has been already reported by Bohr et al. For example, the STM for the occupied states manifests itself in the images corresponding to the lone-pair of Sb in the second layr near the In-vacancy at a high bias and to the bonding orbitals between the outermost layr of In and the second layr of Sb at a low bias. Occasionally, bilayr steps, the edges of which are perpendicular to eht [112] or [112] direction were observed. A novel model of these step structures is proposed on the basis of the electron counting model. The Sn is non-periodically adsorbed on the following three sites of the InSb (111) A-2x2 surface ; on-top sites of the In-vacancy, of the Sb in the second layr, and of the In in the outermost layr. Of these adsorption sites, the on-top of In-vacancy is most favorably occupied by Sn.
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Jun Nakamura: "Inhomogenious charge transfer in an incommensurate system" Physical Review B. 51. 5433-5436 (1995)
Jun Nakamura:“不相称系统中的非均匀电荷转移”物理评论 B. 51. 5433-5436 (1995)
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通讯作者:
Hiroo Omi: "Polarity propagation in the InSb/alpha-Sn/InSb heterostructure" Physical Review Letters. 72. 2596-2599 (1994)
Hiroo Omi:“InSb/α-Sn/InSb 异质结构中的极性传播”物理评论快报。
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Jun Nakamura: "Surfactant-induced bond strengthening in as-grown film surface" Japanese Journal of Applied Physics. (印刷中). (1996)
Jun Nakamura:“生长薄膜表面的表面活性剂诱导粘合”,《日本应用物理学杂志》(出版中)。
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Jun Nakamura: "Surfactant-induced bond strengthening in as-grown film surface" Japanese Journal of Applied Physics. (in press). (1996)
Jun Nakamura:“生长薄膜表面的表面活性剂诱导的粘合强化”日本应用物理学杂志。
DOI:
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发表时间:
期刊:
影响因子:
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作者:
[]
通讯作者:
Hiroo Omi: "Polarity propagation in the InSb/α-Sn/InSb heterostructure" Physical Review Letters. 72. 2596-2599 (1994)
Hiroo Omi:“InSb/α-Sn/InSb 异质结构中的极性传播”《物理评论快报》72. 2596-2599 (1994)。
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共 9 条
Control of the heteroepitaxal growth on vicinal surfaces
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批准号:11555188
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项目类别:Grant-in-Aid for Scientific Research (B).
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资助金额:$4.03万
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财政年份:1999
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负责人:OSAKA Toshiaki
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依托单位:
Dynamical growth processes of group IV semiconducting films on the polar surfaces of compound semiconductors as assessed by RHEED rocking curve
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批准号:08455341
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$4.99万
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财政年份:1996
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负责人:OSAKA Toshiaki
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依托单位:
Study of Heteroepitaxial Growth Dynamic on Compound Semiconductor substrates
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批准号:02452248
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$3.52万
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财政年份:1990
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负责人:OSAKA Toshiaki
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依托单位:
Dynamical Observations of MBE Grown Thin Films by Ultrahigh Vacuum In-situ Electron Microscopy
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批准号:63550543
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.41万
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财政年份:1988
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负责人:OSAKA Toshiaki
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依托单位: