Evaluation method of radiative quantumn efficiency in amorphous semiconductor
Evaluation method of radiative quantumn efficiency in amorphous semiconductor
批准号:
06650013
负责人:
NONOMURA Shuichi
金额:
$1.28万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (C)
财政年份:
1994
资助国家:
日本
项目状态:
已结题
起止时间:
1994 至 1995
中文摘要
用光热偏转光谱(PDS)和光声光谱(PAS)研究了薄膜固体的辐射量子效率。主要目的是建立氢化非晶硅、富勒烯薄膜、非晶氮化镓和非晶氧化硅的辐射量子效率的评价方法。(A)通过光致发光的光降解获得了辐射量子效率,在液氮温度下,氢化非晶硅的辐射量子效率约为30%。在表面,由于表面的局域态,RQE较低。用偏振光谱估算了表面和体相的局域态密度,其值分别为9.5×10~(-2)cm~(-2)和1.8×10~(-2)cm~(-2)。通过氧插层在富勒烯中的光致发光降解效应来估算RQE值。(C)TICS制备的氧化硅薄膜质量符合TFT的要求。测量了非晶态氮化镓的吸收系数谱。在非晶态材料中发现了很长的常温持续光电流。(D)利用PAS方法发展了RQEPAS方法。该方法改善了PPES方法由于光在PIRO装置金属电极上的反射和从金属电极透射光产生的噪声信号的误差。(E)发展了光热弯曲光谱技术,用于真空测量。现阶段的灵敏度为10^<;-3-10;-4>;其优点和缺点都已得到证明。
英文摘要
A radiative quantumn efficiency (RQE) in a thin film solid have been studied by using a photothermal deflection spectroscopy (PDS) and a photoacoustic spectroscopy (PAS). A main purpose is to develope the evaluation method for radiative quantumn efficiency of hydrogenated amorphous silicon, fullerene thin films, amorphous garium nitride and amorphous silicon oxide.(a) A radiative quantumn efficiency was obtained by the photo degradiation of photoluminescense, the value was about 30% in hydrogenated amorphous silicon at liquid nitrogen temperature. At the surface, the RQE was low because of the localized state at surface. Also the localized state density of a surface and bulk was estimated by PDS.The values are 9.5x10^<12>cm^<-2> and 1.8x10^<16>cm^<-2>, respectively.(b) The deflecting medium for a measurement of fullerene films has been found. And the RQE value was estimated by the photoluminescence degradiation effect by oxgen intercalation in the fullerene. The value was 5-10% at room temperature.(c) The film quality of silicon oxide produced by TICS is applicable to a TFT.The absorption coefficient spectrum of amorphous garium nitride was measured. The very long persistent photocurrent at room temperature was found in amorphous materials.(d) RQEPAS method was developed by using a PAS method. In this method, the errors of PPES method from light reflection at metal electrodes of piro device and the noise signal from transmitted light through metal electrodes was improved.(e) Photothermal bending spectroscopy was developed for the purpose of a measurement at vaccume. The sensitivity at present stage is 10^<-3>-10^<-4>. The merit and demerit has been demonstrated.
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野々村修一: "アモルファスシリコンメモリー" 応用物理. 64. 1013-1017 (1995)
野野村秀一:《非晶硅存储器》应用物理 64. 1013-1017 (1995)。
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S.Nonomura, S.Kobayashi, T.Gotoh, S.Hirata et.al.: "Photoconductive a-GaN prepared by reactive sputtering" Journal of Non-crystalline Solids. (in print). (1996)
S.Nonomura、S.Kobayashi、T.Gotoh、S.Hirata 等人:“通过反应溅射制备光电导 a-GaN”非晶固体杂志。
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S.Nonomura,S.Kobayashi,T.Gotoh,S.Hirata et.al.: "Photoconductive a-GaN prepared by reactive sputtering" Journal of Non-crystalline Solids. (in print). (1996)
S.Nonomura、S.Kobayashi、T.Gotoh、S.Hirata 等人:“反应溅射制备的光电导 a-GaN”非晶固体杂志。
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S.Hasegawa, T.Nishiwaki, H.Habuchi, S.Nitta, S.Nonomura: "Optical energy gap and below gap optical absorption of fullerene films measured by constant photocurrent method and photothermal deflection spectroscopy" Fullerene Science and Technology. 3. 163-17
S.Hasekawa、T.Nishiwaki、H.Habuchi、S.Nitta、S.Nonomura:“通过恒定光电流法和光热偏转光谱测量富勒烯薄膜的光学能隙和低于能隙的光学吸收”富勒烯科学与技术。
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野々村修一、後藤民浩、仁田昌二: "PDS(光熱偏向分光法)" 応用物理. 36. 1043-1044 (1994)
Shuichi Nonomura、Tamhiro Goto、Shoji Nita:“PDS(光热偏转光谱)”应用物理 36. 1043-1044 (1994)。
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共 15 条
A study on estimation of localized states and its reduction in microcrystalline silicon films 〜An application of resonant photothenmal bending spectroscopy to hetero-structured films〜
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批准号:14350163
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$6.34万
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财政年份:2002
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负责人:NONOMURA Shuichi
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依托单位:
The Study of Light-induced Expansion in Hydrogenated Amorphous Silicon with Photodegradation
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批准号:10650304
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.18万
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财政年份:1998
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负责人:NONOMURA Shuichi
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依托单位:
海外基金