Reactive RF/DC sputter deposition tool for transparent electrodes, insulators and contacts

溅射薄膜和异质结构是先进材料研究和开发新型功能(光电)电子器件和传感器的基本要求。这种反应磁控溅射工具用于加工多达6英寸的晶片衬底，是锡根大学中心纳米加工设施的主要仪器之一。这一核心设施及其洁净室系统地向科学和技术学院及其他地方的所有研究人员提供通道。北莱茵-威斯特伐利亚州和该大学正在将其整合到一个新的纳米科学中心，该中心拥有一个现代化的600平方米的ISO 4无尘室。该战略是在DFG资助的微纳分析核心设施MNaF的明确共享方法下，将大学用于材料和设备开发的纳米制造基础设施合并在传感器系统中心、微纳米化学和工程中心以及创新材料多学科中心。这一战略预期在最好的科学水平上可持续和有效地使用这一沉积工具和所有其他纳米技术工具，配备专门的支助人员，对所涉及的过程进行专业优化，并建立系统的用户准入组织/培训。沉积工具靠近其他制造仪器以及纳米分析实验室，这使得对环境敏感甚至是反应性材料，例如相变材料或能源材料的高度专题研究得以有效开展。因此，从材料的合成到最终器件的应用或表征的整个过程链将在低温和/或高真空条件下实现，单个仪器之间有足够的传输机制。这种溅射工具将主要用于沉积化学计量比的介电薄膜、透明电极和相变材料。这种功能薄膜是光学和生物传感器、钙钛矿型太阳能电池和基于2D材料的纳米电子器件等广泛研究活动的基础。此外，它还将用于沉积结构电极，这将使研究具有新的物理和化学性能的材料成为可能。研究课题包括自旋轨道电子学、激光诱导等离子体、量子发射体和离子传导。溅射薄膜还将用于构建量身定制的MEMS芯片，用于在MNaF进行现场实验。该溅射工具将配备四个RF/DC溅射源、一个用于衬底清洁的等离子体源以及化学计量薄膜和多层膜的反应沉积。此外，它还配备了灵活的基板支架和加热装置。为了方便对反应性样品的研究，该仪器将另外配备一个专用的真空加载锁。强制转运穿梭车将与该提案捆绑包中的所有其他设备共享。

Sputtered films and heterostructures are a fundamental requirement for advanced materials research and to develop novel functional (opto-)electronic devices and sensors.This reactive magnetron sputter tool for processing up to 6” wafer substrates is one major instrument of the central nanofabrication facility at the University of Siegen. This core facility with its clean room systematically provides access to all researchers of the School of Science and Technology and beyond. The state of North Rhine-Westphalia together with the university is integrating this into a new nanoscience center with a modern 600m2 ISO 4 clean room. The strategy is to merge the university’s nanofabrication infrastructure for materials and device development at the Center for Sensor Systems, the Center for Micro- and Nanochemistry and Engineering and the Multidisciplinary Center for Innovative Materials under the clear sharing methodology of the DFG-funded Micro- and Nanoanalytics Core Facility MNaF. This strategy anticipates a sustainable and efficient use of this deposition tool and all other nanotechnological instruments, at the best scientific level, with specialized support personnel, a professional optimization of the involved processes, and a systematic user access organization/training. The close vicinity of the deposition tool to other fabrication instrumentation as well as to the nanoanalytical laboratories allows the efficient development of highly topical research on environmentally sensitive or even reactive materials, e.g., phase-change or energy materials. Therefore, the whole process chain from material’s synthesis to its final device application or characterization will be possible under cryogenic and/or high-vacuum conditions with adequate transport mechanisms between individual instruments.This sputtering tool will dominantly be utilized to deposit stoichiometric dielectric thin films, transparent electrodes and phase-change materials. Such functional thin films are the basis for a broad range of research activities on optical and biological sensors, perovskite solar cells and nanoelectronic devices based on 2D materials. Moreover, it will be used to deposit structured electrodes, which enable research on materials with novel physical and chemical properties. Research topics are spin orbitronics, laser-induced plasmas, quantum emitters as well as ion conduction. Sputtered thin films will also utilized to construct tailored MEMS-based chips for in situ experiments at the MNaF.The sputter tool will be equipped with four RF/DC sputter sources, a plasma source for substrate cleaning as well as the reactive deposition of stoichiometric thin films and multilayers. Moreover, it comes with a flexible substrate holder and heating. To facilitate the research on reactive specimens, the instrument will additionally be equipped with a dedicated vacuum load lock. The mandatory transfer shuttle is will be shared with all other equipment of this proposal bundle.