The Macquarie National Low Temperature Optoelectronic Thin Film Growth Facility

要求为澳大利亚的氮化物和氧化物薄膜生长设施提供资金，该设施配备用于监测生长参数的原位光学分析设备。预计该设施将用于开发光子、电子和光电子应用的材料和器件结构。该设施还将为利用核分析和植入技术、高分辨率x射线衍射、高空间分辨率微阴极发光和其他形式的分析进行基础材料研究提供澳大利亚领先的这些材料来源。生长后评价还需要非原位光学分析设备，以补充和评价原位分析。

Funding is requested for an Australian facility for the growth of nitride and oxide thin films with in-situ optical analysis equipment for the monitoring of growth parameters. It is envisaged that this facility would be for the development of materials and device structures for photonic, electronic and optoelectronic applications. The facility will also provide a leading Australian source of these materials for fundamental material studies utilising nuclear analysis and implantation technologies, high resolution X-ray diffraction, high spatial resolution micro-cathodoluminescence and other forms of analysis. Ex-situ optical analysis equipment is also requested for post-growth evaluation to compliment and evaluate the in-situ analysis.