Mild routes to bulk boron nitride and molecular oxoboranes

本项目的目的是寻找一种温和的方法来制备块状氮化硼和分子氧硼烷。由于其出色的电绝缘和导热性能以及化学和热惰性，氮化硼有可能成为现代计算中的关键材料。氮化硼的合成通常需要高于1500 ° C的温度，使得这些方法与标准器件制造方案不兼容。拟议的计划包括一个低温聚合物介导的路线散装氮化硼，并建立在一系列已知的转换。单体氧代硼烷（RBO; R =有机基团或H）仅在高温下在气相中观察到。硼和氧之间的高反应性三键通常在高于50 K的温度下导致环低聚。该计划的第二个目标是通过庞大的N-杂环烯烃配体的单体氧代硼烷的动力学稳定，这被证明是有用的，在低配位主基化学的背景下。如果获得动力学稳定的单体氧代硼烷，则将探索氧代硼烷在硅烷存在下促进C-F键活化和最终加氢脱氢催化的能力。

The aim of this project is to find a mild route to bulk boron nitride and molecular oxoboranes. Boron nitride has the potential to be a key material in modern computing as a result of its outstanding electrical insulating and heat-conducting properties and its chemical and thermal inertness. The syntheses of boron nitride generally require temperatures above 1500°C, making these methods incompatible with standard device fabrication protocols. The proposed program includes a low-temperature polymer-mediated route to bulk boron nitride and is built upon a series of known transformations. Monomeric oxoboranes (RBO; R = organic group or H) are only observed in the gas phase at high temperatures. The highly reactive triple bond between boron and oxygen generally leads to cyclooligomerization at temperatures higher than 50 K. A second goal of this program is the kinetic stabilization of monomeric oxoborane by bulky N-heterocyclic olefin ligands, which were shown to be useful in the context of low coordinate main group chemistry. If a kinetically stabilized monomeric oxoborane is obtained, the oxoborane will be explored for its ability to promote C-F bond activation and eventually hydrodefluorination catalysis in the presence of silanes.