Production and control of micro-plasmas by pulsed power technology

研究的目的是利用脉冲功率技术产生具有高密度和/或高温的微等离子体。在等离子体科学中已经研究过相对低压气体中的等离子体。研究目标的等离子体不同于低压气体中的常规等离子体。在这里，微等离子体是在高压气体、液体和超临界流体中通过脉冲功率以极短的脉冲宽度产生的。高效率的脉冲发电和高效率的微尺寸区域供电是产生微等离子体的重要条件。研究课题不仅是微等离子体的产生，而且是脉冲功率的高效传输和注入。研制了6ns Blumline线发生器、利用双极结晶体管的微型马克思发生器和利用磁脉冲压缩的重复发生器三种脉冲发电机。这些脉冲发电机已被用于在高压气体、水和超临界co2中产生微等离子体。观察了各材料放电等离子体的过程。在等离子体内部和附近观察到激波、强电场、自由基和紫外线。利用这些高能量密度现象，对大坝中的藻类进行了处理、化合物的分解和杀菌。此外，还研究了直流驱动的常压空气等离子体射流在微生物刺激、半导体器件局部清洗等方面的应用。在一定条件下，焊枪的最大长度可达40 mm。利用脉冲功率产生的z夹缩等离子体，进行了用于光刻的极紫外光辐射研究。最近的发展是使用旋转电极以承受高输入能量。激光照射在锡覆盖的旋转电极表面，产生等离子体。结果表明，用这种方法发射的极紫外光是由z箍缩等离子体产生的。少

The aim of researches is to produce micro plasmas with high density and/or high temperature using pulsed power technologies. Plasmas in comparatively low pressure gases have been treated in plasma science. The plasma of research target is different from the conventional plasmas in low pressure gases. Here, the micro plasmas are produced in high pressure gases, liquid and supercritical fluid by pulsed power with an extremely short pulse width. The high efficient pulsed power generation and the high efficient supply into a micro size region are important to produce the micro plasmas. The research subjects are not only the micro plasma production but also the efficient transmission and injection of pulsed power. The three kinds of pulsed power generators, a 6ns Blumline line generator, a miniature Marx generator using bipolar junction transistors and a repetitive generator using magnetic pulse compression, have been developed. These pulsed power generators have been used to produce micro … More plasmas in high-pressure gases, water and supercritical CO_2. The progress of discharge plasmas in each material has been observed. The shock waves, high electric field, radicals and ultraviolet light were observed in and near the plasmas. By using these high energy density phenomena, the algae treatment in dam, the decomposition of chemical compound and the sterilization have been done. Furthermore, a dc-driven atmospheric pressure air plasma jet has been investigated for stimuli for microorganisms, local cleaning of semiconductor devices and so on. The maximum torch length of 40 mm was obtained under certain conditions. The researches of EUV radiation for Lithography have been done by using z-pinch plasmas produced by pulsed power. Recent development is to use rotating electrodes in order to bear high input energy. The laser is radiated on the surface of the rotating electrode covered by tin, and the plasma is produced. It was clarified that the EUV light emission by these method occurs by the z-pinch plasma. Less