Scanning electron microscope with focused ion beam, FIB-SEM

FIB-SEM将在HFU作为一个综合设施使用，具有通用和多功能的纳米制造和纳米表征选项，用于薄膜的局部涂覆，具有nm分辨率的材料结构化，以及高分辨率原位制备的分析表征。根据使用概念，主要用途是由5位教授和他们的AG该设备将被集成到现有的工艺中，特别是在Si和SOI基微技术中，其中将研究新的结构化和涂层工艺，后者只有通过FIB-SEM提供的微结构化和纳米结构化能力才有可能开发。通过利用新的局部涂层和结构化技术，特别是可以生成微米和纳米系统原型，以测试和展示微米和纳米级新系统原理的可靠性。该投资将扩大微纳米系统技术实验室的制备设施。纳米尺度的结构化也将使超材料的实现成为可能，并将扩展Mescheder小组多年前在纳米材料领域使用自组织过程已经开始的成功研究。该设备提供的表征可能性将应用于有针对性的工艺开发（特别是ALD，长期稳定的阻隔涂层，AG布赫）和新制造工艺的分析（增材制造，工具和工件&材料检查，AG Azarhoushang和Mozaffari）。特别是多孔硅（PSi）及其应用、柔性电子和传感器、生产技术、纳米孔分子诊断（AG Deigner）和材料研究与开发等研究课题将得到持续加强。申请人的研究能力满足不同的科学领域：系统技术（微系统、生物医学系统技术）;材料科学（功能材料和超材料的制造、开发和特性）;生产技术（增材、机加工和烧蚀生产技术）;以及生物和分析化学。计划的投资将支持许多正在进行和未来的研究项目的有关研究小组。此外，申请人的研究概况的国际知名度将大大加强。几个实际的研究领域，如微电子，纳米技术，光学技术将解决和具体的研究项目覆盖。FIB-SEM还将改善申请人进入国家和欧洲项目的机会，并将促进国际合作机会。这一研究手段还将提高实施许多监督博士学位的方法可能性（4名申请人已经与大学有关）。

The FIB-SEM will be used at the HFU as an integrated facility with universal and versatile nanomanufacturing and nanocharacterization options used for local coating of thin films, structur-ing of materials with a nm-resolution, as well as for analytic characterization with a high resolution in-situ preparation. According to the utilisation concept, the main use is intended to be by 5 professors and their AG The device will be integrated in the already existing processes, es-pecially in Si- and SOI-based microtechnology, where new structuration and coating proce-dures will be investigated, the latter being possible to develop only thanks to the micro- and nanostructuration capabilities offered by a FIB-SEM. By taking benefit of novel local coating and structuration techniques, it will be possible especially to generate micro- and nanosystem prototypes in order to test and demonstrate the reliability of new system principles at the micro- and nanoscale. The investment will expand the preparation facilities in the technology lab for micro- and nanosystems. The structuring at the nm-scale will enable also the realization of metamaterials and will extend the successful research, already begun many years ago in Mescheder’s group, in the field of nanometamaterials using self-organized processes. The characterization possibilities offered by the device will be applied to targeted development of processes (especially for ALD, long-term stable barrier coatings, AG Bucher) and for analysis of new manufacturing processes (additive manufacturing, tool and workpiece & material exam-inations, AG Azarhoushang and Mozaffari). In particular, the research topics porous silicon (PSi) and its applications, flexible electronics and sensors, production technology, molecular diagnose with nanopores (AG Deigner), and material research and development will be sus-tainably reinforced. The research competencies of the applicants meet different scientific fields: system technology (microsystem, biomedical system technology); material science (manufacturing, development and properties of functional and metamaterials); production technology (additive, machining and ablative production technology); as well as bio- and ana-lytical chemistry.The planned investment will support numerous ongoing and future research projects of the involved research groups. Furthermore, the international visibility of the re-search profile of the applicants will be significantly strengthened. Several actual research fields like microelectronics, nanotechnology, optical technology will be addressed and covered with concrete research projects. FIB-SEM will also improve the access of the applicants to national and European programs, and will promote international cooperation opportunities. This research device will also enhance the methodological possibilities for implementation of numerous supervised PhDs (4 of the applicants are already associated to universities).