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Study on the primary dissociation processes of monosilane molecule by electron impact

Study on the primary dissociation processes of monosilane molecule by electron impact
电子轰击甲硅烷分子初级解离过程的研究
批准号:
63540284
负责人:
TSURUBUCHI Seiji
金额:
$1.22万
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (C)
财政年份:
1988
资助国家:
日本
项目状态:
已结题
起止时间:
1988 至 1989

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中文摘要
翻译
一般认为,在辉光放电等离子体中形成非晶硅薄膜的早期过程中,SiH_4分子的电子碰撞解离过程起着重要的作用。研究具有一定能量的一个电子与一个SiH_4分子的单碰撞过程是最基础、最重要的知识之一。在本工作中,测量了从阈值到1000 eV的能量范围内电子碰撞从SiH4中分裂出来的激发碎片的发射截面。目前还没有关于SiH_4真空紫外区发射截面测量的其他报道。下面我们总结一下所获得的结果。不仅在可见光区,而且在真空紫外区对H、Si、Si^+、SiH等碎片物种进行了详细的光谱指认。2.测量了上述各组分的绝对发射截面。3.电子束的能量覆盖范围很广,从阈值到1000 eV。4.详细测量和讨论了激发函数的精细结构。特别是,SiH(A-X)在20 eV附近的截面特征与以前的工作有很大的不同。5.用统计分布的思想解释了激发态氢原子的发射强度与主量子数n的关系。6.研究发现,SiH_4分子的对称性禁忌态在产生激发态氢原子中起着重要的作用。
英文摘要
It is generally said that the dissociation process of SiH_4 molecule by electron impact plays an important role in the early steps of building up thin film of amorphous silicon in glow discharge plasmas. It is one of the most fundamental and important knowledge to investigate what happen in the single collision between one electron with definite energy and one SiH_4 molecule. In the present work, the emission cross sections for excited fragments split from SiH_4 by electron impact were measured in the energy range from the threshold to 1000 eV. There is no other report on the measurement of the emission cross sections in the vacuum ultra-violet region for SiH_4. In the following we summarize the results obtained.1. A detailed spectroscopic assignment for fragment species such as H, si, Si^+, SiH were carried out not only in the visible but also in the vacuum ultraviolet regions. 2. The absolute emission cross sections were measured for those species mentioned above. 3. The energy of electron beam covers a wide range from the threshold up to 1000 eV. 4. The fine structure of the excitation functions were measured and discussed in detail. Especially, the feature of the cross sections for SiH (A-X) around 20 eV differs markedly from the works reported before. 5. The dependence of the emission intensities of the excited hydrogen atom on the principal quantum number n is explained by the idea of the statistical distribution. 6. It was found that the symmetry forbidden states of SiH_4 molecule play a considerable role in producing excited H atoms.
期刊论文(15)
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会议论文
S.Tsurubuchi,K.Motohashi,S.Mstsuoka,and T.Arikawa: "Dissociative Excitation of SiH_4 Molecule by Electron Impact" Atomic Collision Research in Japan. 15. 15 (1989)
S.Tsurubuchi、K.Motohashi、S.Mstsuoka 和 T.Arikawa:“电子碰撞对 SiH_4 分子的解离激发”日本原子碰撞研究。
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通讯作者:
S.Tsurubuchi;K.Watanabe;K.Motohashi;T.Arikawa: Atomic Collision Research in Japan. 14. 23- (1988)
S.Tsurubuchi;K.Watanabe;K.Motohashi;T.Arikawa:日本原子碰撞研究。
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鶴淵誠二、渡辺和隆、本橋健次、蟻川達男: 東京農工大学科学技術展'88 第3回先端科学技術展 資料集. 116- (1988)
鹤渊诚二、渡边和隆、本桥健二、有川龙夫:东京农工大学科技展88第3届先进科技展资料集116-(1988)。
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鶴淵誠二、渡辺和隆、本橋健次、蟻川達男: 日本物理学会第44回年会講演予稿集. 4. (1989)
Seiji Tsurubuchi、Kazutaka Watanabe、Kenji Motohashi、Tatsuo Arikawa:日本物理学会第 44 届年会论文集 4。(1989 年)。
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