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Beyond the Ferroelectric Field Effect Transistors

Beyond the Ferroelectric Field Effect Transistors
超越铁电场效应晶体管
批准号:
DP220103229
负责人:
Prof Sean Li
金额:
$36.69万
依托单位国家:
澳大利亚
项目类别:
Discovery Projects
财政年份:
2022
资助国家:
澳大利亚
项目状态:
已结题
起止时间:
2022-01-01 至 2024-12-31

项目摘要

项目成果

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中文摘要
翻译
冯·诺伊曼范式是基于中央处理器(CPU)和存储器之间的数据交换的现代计算系统的基础。CPU和内存之间的物理分离将导致冯·诺伊曼瓶颈--一堵限制情景智能应用程序数据处理速度的内存墙。该项目旨在开发一种新型的铁电场效应晶体管,它将铁电材料集成到半导体晶体管结构中,在单个器件级别上融合逻辑和存储功能。这将解决存储墙问题,同时为未来的内存中逻辑和以数据为中心的计算模式提供低功耗、高速度、高密度和长数据保留时间。
英文摘要
The von Neumann paradigm is the foundation of modern computing systems, which are based on the data exchange between central processing unit (CPU) and memory. The physical separation between the CPU and memory will cause von Neumann bottleneck – a memory wall to limit the data processing speed for contextually intelligent applications. This project aims to develop a novel ferroelectric field effect transistor that integrates a ferroelectric material into a semiconductor transistor structure to merge logic and memory functionalities in a single-device level. This will solve the memory wall problem while provide low power, high speed, high density and long data retention time for future logic-in-memory and data centric computing paradigms.
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