Wide Concentration Range Zn-doping in CuGaS_2 using Atomic Layr Epitaxy and Elucidation of the Role of Zn
Wide Concentration Range Zn-doping in CuGaS_2 using Atomic Layr Epitaxy and Elucidation of the Role of Zn
批准号:
08650007
负责人:
IIDA Seishi
金额:
$1.41万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1996
资助国家:
日本
项目状态:
已结题
起止时间:
1996 至 1997
中文摘要
以CuCl、(C_2H_5)_5GaCl和H_2S为供料源,在GaP(100)衬底上交替供料条件下气相外延生长CuGaS_2的实验研究表明:在金属源(CuCl, (C_2H_5)_2GaCl)和H_2S分别交替进料的情况下,发生了面向c轴的生长,每周期生长速率为1/ 8c晶格常数,即1/2的单分子层厚度。而在完全分离交替进料条件下,以每周期1层厚度的生长速率向c轴方向生长。这些结果被认为与原子层生长相对应。每一种源的一种供应导致一层原子层的生长,两种金属源之间的H_2S供应是生长所必需的。这表明两种金属原子的重排是CuGaS_2生长的必要条件。在完全分离的交替源喂入下,同时喂入Zn和Cu源与同时喂入Zn和Ga源的情况下,锌相关发光的外观存在较大差异。然而,这一事实是否与锌的位置选择性掺杂直接相关,必须考虑到上述两种金属原子的重排可能性。
英文摘要
From experimental investigation of vapor phase epitaxial growth of CuGaS_2 on GaP (100) substrates under alternate feeding conditions using the sources of CuCl, (C_2H_5)_5GaCl and H_2S,the followings became clear.Under separated alternate feeding of metal sources (CuCl, (C_2H_5)_2GaCl) and H_2S,the growth oriented toward c-axis with growth rate per cycle of 1/8 c lattice constant, i.e., 1/2 mono-molecular layr thickness occurs. While under completely separated alternate source feeding, the growth oriented toward c-axis with growth rate per cycle of one mono-layr thickness does. These results are thought to correspond to atomic layr growth. One supply of each source causes one atomic layr growth, and H_2S supply between two kind of metal sources supply is essential for the growth. This fact suggests an occurrence of rearrangement of two kinds of metallic atoms is necessary for the growth of CuGaS_2.Under completely separated alternate source feeding, the appearance of Zn-related luminescence showed big difference between the cases with simultaneous Zn and Cu sources feeding and with simultaneous Zn and Ga sources feeding. However, whether this fact is directly related to site selective doping of Zn or not must be discussed taking into account rearrangement possibility of two kind of metallic atoms described above.
期刊论文(3)
专著(0)
科研奖励(0)
会议论文
J.Mitomo, H.Sato, T.Terasaka, T.Matsumoto, H.Uchiki and S.Iida: "Vapor Phase Epitaxy of CuGaS_2 Using CuCl,Dietylegalliumchloride and H_2S Sources under Simultaneous and Alternate Feeding Conditions" Inst.Phys,Conf.Ser.No 152 Ternary and Multinary Compoun
J.Mitomo、H.Sato、T.Terasaka、T.Matsumoto、H.Uchiki 和 S.Iida:“在同时和交替进料条件下使用 CuCl、二乙基氯化镓和 H_2S 源进行 CuGaS_2 的气相外延”Inst.Phys,Conf。
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作者:
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通讯作者:
J.Mitomo, H.Sato, T.Terasako, T.Matsumoto, H.Uchiki and S.Iida: "Vapor Phase Epitaxy of CuGaS_2 Using CuCl,Dietylgalliumchloride and H_2S sources under Simultaneous and Alternate Feeding Conditions" Porc.ICTMC-11(Institute of Physics). (印刷中). (1998)
J.Mitomo、H.Sato、T.Terasako、T.Matsumoto、H.Uchiki 和 S.Iida:“在同时和交替进料条件下使用 CuCl、二乙基氯化镓和 H_2S 源进行 CuGaS_2 的气相外延” Porc.ICTMC-11(物理研究所)(正在出版)(1998)。
DOI:
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作者:
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通讯作者:
J.Mitomo, H.Sato, T.Terasako, T.Matsumoto, H.Uchiki and S.Iida: "vapor Phase Epitaxy of CuGaS_2 Using CuCl, Dietylegalliumchloride and H_2S Sources under Simultaneous and Altemate Feeding Conditions" Inst.Phys.Conf.Ser.No 152, Termary and Multinary Compou
J.Mitomo、H.Sato、T.Terasako、T.Matsumoto、H.Uchiki 和 S.Iida:“在同时和交替进料条件下使用 CuCl、二乙基氯化镓和 H_2S 源进行 CuGaS_2 的气相外延” Inst.Phys.Conf。
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作者:
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通讯作者:
Vapor Phase Epitaxy of Copper Chalcopyrites Having Wide Band Gaps
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批准号:03650250
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.15万
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财政年份:1991
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负责人:IIDA Seishi
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依托单位:
Application of a-C:H Films to Optical Information Recording
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批准号:63550037
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.34万
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财政年份:1988
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负责人:IIDA Seishi
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依托单位: