Application of a-C:H Films to Optical Information Recording

a-C:H薄膜在光信息记录中的应用

基本信息

  • 批准号:
    63550037
  • 负责人:
  • 金额:
    $ 1.34万
  • 依托单位:
  • 依托单位国家:
    日本
  • 项目类别:
    Grant-in-Aid for General Scientific Research (C)
  • 财政年份:
    1988
  • 资助国家:
    日本
  • 起止时间:
    1988 至 1989
  • 项目状态:
    已结题

项目摘要

Amorphous C:H films prepared by glow discharge decomposition of C_3H_3 were found to exhibit a photo-etching phenomenon under UV light exposure. The estimated resolving power of this photo-etching is high enough to construct surface relief holograms. Direct formation of two beam interference relief holograms using an UV He-Cd laser has been tried for the first time. The photographed images reconstructed by a He-Ne laser (633 nm) and Ar^+ laser (488 nm) were shown to hold the diffraction relation and to give the correct value of grating period expected for optical configuration used at hologram recording. These results present confirmative evidence that the relief hologram was really constructed in the a-C:H film.In order to avoid long-term deteriorations of recorded information by light, formations of replica holograms were tried with a standard method containing a transforming process of original relief holograms to metal moulds followed by an embossing process of these moulds in soft plastics. The metal moulds were made by Ni- electroplating of Au-evaporated a-C:H films having original optical information as surface reliefs. Successful copies of original holograms were achieved using thermoplastic poly vinyl chloride sheets. This process has a capability of application for mass production of the same information. The diffraction efficiencies of these replica holograms reached up to 80% of that of the corresponding original holograms, though the absolute values were not high, reflecting low diffraction efficiencies of original holograms. This study demonstrated, for the first time, that a-C:H films have an interesting possibility for high resolution optical recording medium being recordable only by optical exposure.
用辉光放电分解C_3H_3制备的非晶态C:H薄膜在紫外光照射下出现光刻蚀现象。这种光刻的估计分辨率足够高,足以构建表面浮雕全息图。首次尝试用紫外He-Cd激光器直接制作双光束干涉消除全息图。用He-Ne激光(633 Nm)和Ar~(++)激光(488 Nm)再现的图像符合衍射关系,并给出了用于全息记录的光学配置所需的正确的光栅周期。这些结果证实了浮雕全息图确实是在a-C:H薄膜中构建的。为了避免记录的信息在光的作用下长期恶化,采用了一种标准的方法来尝试复制全息图的形成,该方法包括将原始浮雕全息图转换为金属模具,然后将这些模具压印在软塑料中。金属模具是以原始光学信息作为表面浮雕,在镀金a-C:H膜上电镀而成。使用热塑性聚氯乙烯薄片成功复制了原始全息图。该工艺具有批量生产相同信息的应用能力。这些复制全息图的衍射效率虽然绝对值不高,但达到了相应原始全息图的80%,反映了原始全息图的低衍射效率。这项研究首次证明,a-C:H薄膜具有一种有趣的可能性,即只能通过光学曝光来记录高分辨率光学记录介质。

项目成果

期刊论文数量(3)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
M.Irie,N.Kouzu,Y.Kuramochi,S.Iida and K.Sakuda: "A Possibility of Application of Phote-Etching of a-c:H Films to Relief Holograms" Jpn.J.Appl.Phys.28、suppl,28-3. 265-270 (1989)
M.Irie、N.Kouzu、Y.Kuramochi、S.Iida 和 K.Sakuda:“应用 a-c:H 薄膜光刻来制作浮雕全息图的可能性”Jpn.J.Appl.Phys.28,增刊, 28-3。265-270(1989)
  • DOI:
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    0
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  • 通讯作者:
M.Irie,N.Kouzu,Y.Kuramochi,S.Iida and K.Sakuda: "A Possibility of Application of Photo-Etching of a-C:H Films to Relief Holograms" Jpn.J.Appl.Phys.28,suppl,28-3. 265-270 (1989)
M.Irie,N.Kouzu,Y.Kuramochi,S.Iida 和 K.Sakuda:“应用 a-C:H 薄膜光刻来制作浮雕全息图的可能性”Jpn.J.Appl.Phys.28,suppl,
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"A Possibility of Application of Photo-Etching of a-C:H Films to Relief Holograms" Jpn. J. Appl. Phys.28, suppl. 28-3. 265-270 (1989)
“a-C:H 薄膜光蚀刻应用于浮雕全息图的可能性”Jpn。
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IIDA Seishi其他文献

IIDA Seishi的其他文献

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{{ truncateString('IIDA Seishi', 18)}}的其他基金

Wide Concentration Range Zn-doping in CuGaS_2 using Atomic Layr Epitaxy and Elucidation of the Role of Zn
使用原子层外延在 CuGaS_2 中进行宽浓度范围的 Zn 掺杂并阐明 Zn 的作用
  • 批准号:
    08650007
  • 财政年份:
    1996
  • 资助金额:
    $ 1.34万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
Vapor Phase Epitaxy of Copper Chalcopyrites Having Wide Band Gaps
宽带隙铜黄铜矿的气相外延
  • 批准号:
    03650250
  • 财政年份:
    1991
  • 资助金额:
    $ 1.34万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (C)
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