Processing of New Functional Material Using Electron Beam Excited Plasma
Processing of New Functional Material Using Electron Beam Excited Plasma
批准号:
11650140
负责人:
ABRAHA Petros
金额:
$0.51万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1999
资助国家:
日本
项目状态:
已结题
起止时间:
1999 至 2000
中文摘要
照射在靶面上的脉冲激光产生含有原子尺度的粒子和大小不一的液滴的等离子体。这些发射的粒子沿目标法线方向移动。通过将这些颗粒沉积在衬底表面,可以设想各种有用的工程实践。膨胀的等离子体通常是前向峰化的,并且正向峰化的程度主要取决于激光在靶面上的尺寸、激光能量密度、波长和脉冲宽度。这些因素决定了薄膜的均匀性和均匀性,这在制造中非常重要。在本研究中,首先建立了基于流体力学模型的预测沉积层厚度分布的数值计算方法。然后,将结果与聚焦脉冲激光照射到铝带靶表面的实验结果进行了比较。沉积膜的厚度分布为mea…。在垂直和水平方向上更有把握。我们的实验和数值计算显示出非常相似的地方。根据厚度分布的结果,给出了与沉积实践相关的实用配方。以下是从本研究的实验和预测模拟中得出的结论。由高深宽比照射的靶区产生的沉积区域在平行于照射区域的长边的方向上窄,在平行于照射区域的短边的方向上宽。该程度取决于受照射目标区域的纵横比的值。从点、方、照射靶区产生的沉积区在所有方向上都具有相同的尺寸。正方形照射靶区产生的沉积区比高深宽比照射区产生的沉积区宽。因此,通过简单地将激光聚焦到高深宽比照射区域,可以极大地提高高深宽比衬底的沉积速度。当沿着所需的沉积区域扫描时,通过旋转衬底可以获得厚度均匀。较少
英文摘要
Pulsed laser beams irradiated onto the target surface produce plasma containing atomic scale particles and droplets of various sizes. These emitted particles travel in the direction of the target normal. Various useful engineering practices can be envisaged by depositing these particles on the surface of a substrate. The expanding plasma is usually forward peaked and the degree of forward peaking primarily depends on the dimensions of the laser beam on the target surface, the laser energy density and wavelength and pulse duration. These factors determine the film uniformity and homogeneity that are of significant importance in manufacturing. In this research at first, numerical calculations that predict the deposit thickness distribution were set based on hydrodynamical model. Then, the results were compared with experimental results obtained by irradiating a focussed pulse laser beam onto the surface of an aluminum tape target. The thickness distributions of the deposited film are mea … More sured in the vertical and horizontal directions. Our experiments and numerical calculations show close resemblance. Based on the results of the thickness distributions, practical recipes relevant to deposition practice are presented. Here are the conclusions drawn from the experimental and predicted simulation of this research.1. The deposit area produced from a high aspect ratio irradiated target area is narrow in the direction parallel to the longer side and wide in the direction parallel to the shorter side of the irradiated area. The degree depends on the value of the aspect ratio of the irradiated target area.2. The deposit area produced from a spot, square, irradiated target area has the same dimension in all directions. And the deposit area produced from a square irradiated target area is wider than the deposit area produced from a high aspect ratio irradiated area.3. Thus, the deposition rate of high aspect ratio substrates can be greatly improved by simply focussing the laser beam into a high aspect ratio irradiated area. The thickness uniformity can be obtained by rotating the substrate while scanning along the required deposition area. Less
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Petros Abraha: "パルス・レーザー・デポジションによる薄膜形成に関する考察"日本機械学会東海支部第49期総会講演会講演論文集. NO.003-1. 253-254 (2000)
Petros Abraha:“脉冲激光沉积薄膜形成的研究”日本机械工程师学会东海分会第 49 届大会论文集 NO.003-254(2000 年)。
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P.Abraha, Y.Hisada, N.Yamaguchi, T.Hara: "Thin Film Coating by Pulsed Laser Beam Focussed to High Aspect Ratio Spot"Journal of Surface & Coatings Technology. (Accepted).
P.Abraha、Y.Hisada、N.Yamaguchi、T.Hara:“通过脉冲激光束聚焦到高深宽比点进行薄膜涂层”表面杂志
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P.Abraha,Y.Hisada,N.Yamaguchi,T.Hara: "Thin Film Coating by Pulsed Laser Beam Focussed to High Aspect Ratio Spot"Journal of Surface & Coatings Technology (Accepted). (To be published).
P.Abraha、Y.Hisada、N.Yamaguchi、T.Hara:“通过脉冲激光束聚焦到高深宽比点进行薄膜涂层”表面杂志
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P.Abraha, Y.Hisada, N.Yamaguchi, T.Hara: "Thin Film Deposition by Using Pulse Laser Beam"Japanese Society of Mechanical Engineers Tokai region Branch. No003-1. 253-254 (2000)
P.Abraha、Y.Hisada、N.Yamaguchi、T.Hara:“使用脉冲激光束进行薄膜沉积”日本机械工程师学会东海地区分会。
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K.Taniguchi,M.Sugimoto,S.Masuko,T.Kobayashi,M.Hamagaki,P.Abraha,T.Hara: "High Degree of dissociation of Nitrogen Molecules in Large Volume Electron Beam Excited Plasma"Japanese Journal of Applied Physics. VOL.39. L999-L1001 (2000)
K.Taniguchi、M.Sugimoto、S.Masuko、T.Kobayashi、M.Hamagaki、P.Abraha、T.Hara:“大体积电子束激发等离子体中氮分子的高度解离”日本应用物理学杂志。
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