Precise thickness distribution control of soft X-ray multilayers using a speed programmahle shutter and application to aspherics fabrication

使用速度可编程快门精确控制软 X 射线多层膜的厚度分布及其在非球面制造中的应用

• 批准号: 15560016
• 负责人: HATANO Tadashi
• 金额: $ 1.98万
• 依托单位: TOHOKU UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2003
• 资助国家: 日本
• 起止时间: 2003 至 2004
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-15560016/
• 关键词: multilaver; thickness distribution control; speed programmable shutter; ion beam sputtering; ion gun; concave mirror; normal incidence spectral reflectance; 膜厚制御

In ion beam sputtering deposition, the temporal stability of ion guns is a dominant factor for the accuracy of thickness control. Mo/Si multilayer concave mirrors for use at 13.5 rim need a reflectance peak wavelength within an error of 2%, while it has been 10% owing to the variation of the sputtering rate of our deposition apparatus. Therefore a stable run of ion guns to decrease the sputtering rate variation under 2% has been significant. Main parameters of an ion gun are Ar flow rate, accelerator voltage and extractor voltage. Ion beam output dependence on these factors has been investigated in detail. The condition for maximum ion beam output was found to be 1.4 sccm Ar flow rate, -1.4 kV accelerator voltage and +300 V extractor voltage. Then the temporal stability dependence on the Ar flow rate was investigated. The ion beam output was found to become more stable at a lower level when the Ar flow rate increases. The optimum Ar flow rate lies in the range between 1.7 and 2.0 sccm as a conclusion. Furthermore the ion beam output was monitored in the total ion flow and in the ion density by electrodes at the extractor and at the beam shutter, respectively. Strong correlations between the room temperature and the ion flow and between the source voltage and the ion flow were found, which implies how to improve the stability.In our original technique of the programmable shutter for thickness distribution control, the calculation method of the minimum elapsed time was newly derived and the shutter shape to extend the mechanical stroke was reexamined. Mo/Si multilayer concave mirrors of radii of curvature of 50, 270 and 300 mm were fabricated and their thickness distributions were evaluated by normal incidence soft X-ray reflectometry at the Photon Factory, KEK.

在离子束溅射沉积中，离子枪的时间稳定性是影响厚度控制精度的主要因素。在13.5边缘处使用的Mo/Si多层凹面镜需要反射峰波长误差在2%以内，而由于沉积设备溅射速率的变化，反射峰波长误差在10%以内。因此，稳定运行离子枪，将溅射率变化降低到2%以下是非常重要的。离子枪的主要参数有氩气流速、加速器电压和萃取器电压。详细研究了这些因素对离子束输出的依赖关系。实验结果表明，离子束最大输出条件为：Ar流量1.4 sccm，加速器电压-1.4 kV，萃取器电压+300 V。然后研究了时间稳定性与氩流量的关系。当氩流量增加时，离子束输出在较低水平下变得更加稳定。结果表明，最佳氩流量为1.7 ~ 2.0 sccm。此外，在萃取器和束闸处分别用电极监测总离子流和离子密度中的离子束输出。发现室温与离子流、源电压与离子流之间存在较强的相关关系，提示如何提高稳定性。在原有的可编程快门厚度分布控制技术中，重新推导了最小运行时间的计算方法，并重新考察了延长机械行程的快门形状。制备了曲率半径分别为50mm、270 mm和300mm的Mo/Si多层凹面镜，并用法向入射软x射线反射仪测量了其厚度分布。

项目成果

Thickness monitoring of nm period EUV multilayer fabrication by ellipsometry

通过椭圆光度法监测纳米周期 EUV 多层制造的厚度

• 发表时间: 2004
• 期刊: AIP Conference Proceedings 705
• 作者: Kazuhiro Endo;Peter Badica;Tamio Endo;Toshihide Tsuru
• 通讯作者: Toshihide Tsuru

Introduction of Synchrotron Radiation Research

同步辐射研究简介

• 发表时间: 2004
• 作者: Takahisa Sakurada;Michi Ogata;Atsushi Kamiya;Kazuhiro Endo;Tamio Endo;渡辺 誠;Makoto Watanabe
• 通讯作者: Makoto Watanabe

Thin film filters for an EUV multilayer mirror optics with a laser produced plasma light source

用于具有激光产生等离子光源的 EUV 多层镜光学器件的薄膜滤光片

• 发表时间: 2005
• 期刊: Journal of Electron Spectroscopy and Related Phenomena 144-147
• 作者: Tamio Endo;Kouji Yoshii;Takahisa Sakurada;Michi Ogata;Ajay K. Sarkar;Masanori Okada;Hidetaka Nakashima;Tetsuo Harada
• 通讯作者: Tetsuo Harada

Accurate measurement of EUV multilayer period thickness by in situ automatic ellipsometry

原位自动椭偏仪精确测量EUV多层周期厚度

• 发表时间: 2005
• 期刊: Journal of Electron Spectroscopy and Related Phenomena 144-147
• 作者: Tamio Endo;Kouji Yoshii;Takahisa Sakurada;Michi Ogata;Ajay K. Sarkar;Masanori Ogata;Hidetaka Nakashima;K.Z.Liu;Toshihide Tsuru
• 通讯作者: Toshihide Tsuru

放射光科学入門

同步辐射科学简介

• 发表时间: 2004
• 作者: Takahisa Sakurada;Michi Ogata;Atsushi Kamiya;Kazuhiro Endo;Tamio Endo;渡辺 誠
• 通讯作者: 渡辺 誠