Precise thickness distribution control of soft X-ray multilayers using a speed programmahle shutter and application to aspherics fabrication
Precise thickness distribution control of soft X-ray multilayers using a speed programmahle shutter and application to aspherics fabrication
批准号:
15560016
负责人:
HATANO Tadashi
金额:
$1.98万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2003
资助国家:
日本
项目状态:
已结题
起止时间:
2003 至 2004
中文摘要
在离子束溅射沉积中,离子枪的时间稳定性是厚度控制精度的主要因素。Mo/Si多层凹面镜在13.5rim处的反射峰值波长需要在2%的误差内,而由于我们的沉积设备的溅射速率的变化,它已经达到10%。因此,离子枪稳定运行以将溅射速率变化降低到2%以下是重要的。离子枪的主要参数是氩气流量、加速器电压和引出电压。详细研究了这些因素对离子束输出的影响。获得最大离子束输出的条件为:Ar流量为1.4sccm,加速器电压为-1.4kV,引出电压为+300V。然后,时间的稳定性依赖于Ar流量进行了研究。当Ar流量增加时,离子束输出在较低的水平上变得更稳定。最佳Ar流量在1.7 ~ 2.0sccm之间。此外,在总离子流和离子密度中,分别通过提取器和射束快门处的电极来监测离子束输出。发现室温和离子流之间以及源电压和离子流之间存在很强的相关性,这意味着如何提高稳定性。在我们的用于厚度分布控制的可编程快门的原始技术中,重新推导了最小经过时间的计算方法,并重新检查了延长机械行程的快门形状。在KEK的光子工厂制作了曲率半径为50、270和300 mm的Mo/Si多层凹面镜,并利用正入射软X射线反射仪对它们的厚度分布进行了评价。
英文摘要
In ion beam sputtering deposition, the temporal stability of ion guns is a dominant factor for the accuracy of thickness control. Mo/Si multilayer concave mirrors for use at 13.5 rim need a reflectance peak wavelength within an error of 2%, while it has been 10% owing to the variation of the sputtering rate of our deposition apparatus. Therefore a stable run of ion guns to decrease the sputtering rate variation under 2% has been significant. Main parameters of an ion gun are Ar flow rate, accelerator voltage and extractor voltage. Ion beam output dependence on these factors has been investigated in detail. The condition for maximum ion beam output was found to be 1.4 sccm Ar flow rate, -1.4 kV accelerator voltage and +300 V extractor voltage. Then the temporal stability dependence on the Ar flow rate was investigated. The ion beam output was found to become more stable at a lower level when the Ar flow rate increases. The optimum Ar flow rate lies in the range between 1.7 and 2.0 sccm as a conclusion. Furthermore the ion beam output was monitored in the total ion flow and in the ion density by electrodes at the extractor and at the beam shutter, respectively. Strong correlations between the room temperature and the ion flow and between the source voltage and the ion flow were found, which implies how to improve the stability.In our original technique of the programmable shutter for thickness distribution control, the calculation method of the minimum elapsed time was newly derived and the shutter shape to extend the mechanical stroke was reexamined. Mo/Si multilayer concave mirrors of radii of curvature of 50, 270 and 300 mm were fabricated and their thickness distributions were evaluated by normal incidence soft X-ray reflectometry at the Photon Factory, KEK.
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Thickness monitoring of nm period EUV multilayer fabrication by ellipsometry
通过椭圆光度法监测纳米周期 EUV 多层制造的厚度
DOI:
--
发表时间:
2004
期刊:
AIP Conference Proceedings 705
影响因子:
--
作者:
[Kazuhiro Endo, Peter Badica, Tamio Endo, Toshihide Tsuru]
通讯作者:
Toshihide Tsuru
DOI:
--
发表时间:
2004
期刊:
影响因子:
--
作者:
[Takahisa Sakurada, Michi Ogata, Atsushi Kamiya, Kazuhiro Endo, Tamio Endo, 渡辺 誠, Makoto Watanabe]
通讯作者:
Makoto Watanabe
Thin film filters for an EUV multilayer mirror optics with a laser produced plasma light source
用于具有激光产生等离子光源的 EUV 多层镜光学器件的薄膜滤光片
DOI:
--
发表时间:
2005
期刊:
Journal of Electron Spectroscopy and Related Phenomena 144-147
影响因子:
--
作者:
[Tamio Endo, Kouji Yoshii, Takahisa Sakurada, Michi Ogata, Ajay K. Sarkar, Masanori Okada, Hidetaka Nakashima, Tetsuo Harada]
通讯作者:
Tetsuo Harada
Accurate measurement of EUV multilayer period thickness by in situ automatic ellipsometry
原位自动椭偏仪精确测量EUV多层周期厚度
DOI:
--
发表时间:
2005
期刊:
Journal of Electron Spectroscopy and Related Phenomena 144-147
影响因子:
--
作者:
[Tamio Endo, Kouji Yoshii, Takahisa Sakurada, Michi Ogata, Ajay K. Sarkar, Masanori Ogata, Hidetaka Nakashima, K.Z.Liu, Toshihide Tsuru]
通讯作者:
Toshihide Tsuru
放射光科学入門
同步辐射科学简介
DOI:
--
发表时间:
2004
期刊:
影响因子:
--
作者:
[Takahisa Sakurada, Michi Ogata, Atsushi Kamiya, Kazuhiro Endo, Tamio Endo, 渡辺 誠]
通讯作者:
渡辺 誠
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