Development of silica glass for 157nm photolithography

本研究项目的目的是开发用于157纳米光刻的硅玻璃，这是下一代ULSI的一种有前途的工艺。结果表明：(1)对硅玻璃吸收边的认识取得了显著进展。这对于开发具有宽透明紫外区的硅玻璃是非常有用的。(2)揭示了F对VUV区域透明度的影响。(3)在157 nm处，内透射率可提高93%以上。(4)通过模型计算可以估计出F2激光辐照对温度升高和透明度降低的影响。(5)建立了一种精确测量石英玻璃VUV吸收边的方法。

The purpose of this research project is to develop silica glass for 157 nm photolithography, which is a promising process for ULSI in the next generation. The results are summarized as follows:(1) Remarkable advances have been achieved in the understanding of the absorption edge of silica glass. This knowledge is very useful to develop silica glass with wide transparent VUV region.(2) Effects of F on the transparency in VUV region have been revealed.(3) Inner transmittance at 157 nm could be increased over 93%.(4) The effect of F2 laser irradiation on increasing temperature and hence decreasing transparency can be estimated from a model calculation.(5) A method for measuring accurate VUV absorption edge in silica glass has been established.