Development of ultralow-loss glasses by controlling density fluctuations
Development of ultralow-loss glasses by controlling density fluctuations
批准号:
09355021
负责人:
IKUSHIMA Akira J.
金额:
$18.24万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1998
中文摘要
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英文摘要
Since light scattering loss in silica fiber is dominantly caused by "frozen-in" density fluctuations at the glass transition temperature, investigations of structural relaxation around the glass transition temperature are necessary for developing ultralow-loss silica glasses. In this project we tried to measure various properties of silica glasses over a wide-temperature range including the glass transition temperature, and have elucidated structural relaxation processes and their impurity effects as follows :(1)OH or Cl enhances the alpha -relaxation governed by viscous flow, and also generates a sub-relaxational process.(2)he sub-relaxational process is local structural change caused by impurity diffusion.From these results, we have established controlling the structural relaxation by impurity doping, which is a basic technology to develop ultralow-loss glasses. For example, the light scattering loss was reduced by 13% by the addition of only 10 wt.ppm Na_2O to silica glass. This method is also useful for developing silica glasses with high performances such as high UV-proof and high heat-proof properties.
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K.Saito, A.J.Ikushima, T.Ito, and A.Itoh: ""A New Method of Developing Ultralow-loss Glasses"" J.Appl.Phys.81. 7129-7134 (1997)
K.Saito、A.J.Ikushima、T.Ito 和 A.Itoh:““开发超低损耗玻璃的新方法””J.Appl.Phys.81。
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K.Saito and A.J.Ikushima: ""Development of a Wide-temperature Range VUV&UV Phospectrometer and Its Applications to Silica Glass"" J.Non-Cryst.Solids. (in print). (1999)
K.Saito 和 A.J.Ikushima:“宽温范围 VUV 的开发”
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K.Saito and A.J.Ikushima: ""Structural Relaxation Enhanced by Impurities in Silica Glass"" AIP Conference Proceedings of Tohwa University International Symposium on "Slow Dynamics in Complex Systems". CP469. 507-512 (1999)
K.Saito 和 A.J.Ikushima:““二氧化硅玻璃中的杂质增强结构弛豫””东和大学“复杂系统中的慢动力学”国际研讨会 AIP 会议论文集。
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K.Saito: "“Structural Relaxation of the Frozen-in Density Fluctuations in Silica Glass"" Prog.Theor.Phys.Suppl.126. 277-280 (1997)
K. Saito:“二氧化硅玻璃中冻结密度波动的结构弛豫”,Prog.Theor.Phys.Suppl.126 (1997)。
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K.Saito and A.J.Ikushima: ""Reduction of Light-Scattering Loss in Silica Glass by the Structural Relaxation of "Frozen-in" Density Fluctuations"" Appl.Phys.Lett.70. 3504-3506 (1997)
K.Saito 和 A.J.Ikushima:“通过“冻结”密度波动的结构弛豫减少二氧化硅玻璃中的光散射损失”Appl.Phys.Lett.70。
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共 26 条
Development of silica glass for 157nm photolithography
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批准号:12355025
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$12.88万
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财政年份:2000
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负责人:IKUSHIMA Akira J.
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依托单位:
Study on structural relaxation in silica glass
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批准号:09640408
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.56万
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财政年份:1997
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负责人:IKUSHIMA Akira J.
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依托单位:
海外基金