Development of ultralow-loss glasses by controlling density fluctuations
通过控制密度波动开发超低损耗玻璃
基本信息
- 批准号:09355021
- 负责人:
- 金额:$ 18.24万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Scientific Research (A)
- 财政年份:1997
- 资助国家:日本
- 起止时间:1997 至 1998
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
Since light scattering loss in silica fiber is dominantly caused by "frozen-in" density fluctuations at the glass transition temperature, investigations of structural relaxation around the glass transition temperature are necessary for developing ultralow-loss silica glasses. In this project we tried to measure various properties of silica glasses over a wide-temperature range including the glass transition temperature, and have elucidated structural relaxation processes and their impurity effects as follows :(1)OH or Cl enhances the alpha -relaxation governed by viscous flow, and also generates a sub-relaxational process.(2)he sub-relaxational process is local structural change caused by impurity diffusion.From these results, we have established controlling the structural relaxation by impurity doping, which is a basic technology to develop ultralow-loss glasses. For example, the light scattering loss was reduced by 13% by the addition of only 10 wt.ppm Na_2O to silica glass. This method is also useful for developing silica glasses with high performances such as high UV-proof and high heat-proof properties.
由于石英光纤中的光散射损耗主要是由玻璃化转变温度下的“冻结”密度波动引起的,因此研究玻璃化转变温度附近的结构弛豫对于开发超低损耗石英玻璃是必要的。在本项目中,我们试图在包括玻璃化转变温度在内的宽温度范围内测量二氧化硅玻璃的各种性质,并阐明了结构弛豫过程及其杂质效应如下:(1)OH或Cl增强了由粘性流动控制的α-弛豫,并且还产生亚弛豫过程。(2)he亚弛豫过程是由杂质扩散引起的局域结构变化,由此我们确立了通过杂质掺杂控制结构弛豫是研制超低损耗玻璃的基本技术。例如,在石英玻璃中仅加入10wt.ppmNa_2O,光散射损失就降低了13%。该方法还可用于开发具有高性能如高UV耐受性和高耐热性的二氧化硅玻璃。
项目成果
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K.Saito, A.J.Ikushima, T.Ito, and A.Itoh: ""A New Method of Developing Ultralow-loss Glasses"" J.Appl.Phys.81. 7129-7134 (1997)
K.Saito、A.J.Ikushima、T.Ito 和 A.Itoh:““开发超低损耗玻璃的新方法””J.Appl.Phys.81。
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K.Saito and A.J.Ikushima: ""Development of a Wide-temperature Range VUV&UV Phospectrometer and Its Applications to Silica Glass"" J.Non-Cryst.Solids. (in print). (1999)
K.Saito 和 A.J.Ikushima:“宽温范围 VUV 的开发”
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K.Saito and A.J.Ikushima: ""Structural Relaxation Enhanced by Impurities in Silica Glass"" AIP Conference Proceedings of Tohwa University International Symposium on "Slow Dynamics in Complex Systems". CP469. 507-512 (1999)
K.Saito 和 A.J.Ikushima:““二氧化硅玻璃中的杂质增强结构弛豫””东和大学“复杂系统中的慢动力学”国际研讨会 AIP 会议论文集。
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K.Saito and A.J.Ikushima: ""Reduction of Light-Scattering Loss in Silica Glass by the Structural Relaxation of "Frozen-in" Density Fluctuations"" Appl.Phys.Lett.70. 3504-3506 (1997)
K.Saito 和 A.J.Ikushima:“通过“冻结”密度波动的结构弛豫减少二氧化硅玻璃中的光散射损失”Appl.Phys.Lett.70。
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K.Saito, H.Kakiuchida, and A.J.Ikushima: ""Light Scattering Studies on the Glass Transition and the Structure in Silica Glass"" Jpn.J.Appl.Phys.Suppl.37-1. 32-35 (1998)
K.Saito、H.Kakiuchida 和 A.J.Ikushima:“二氧化硅玻璃中玻璃转变和结构的光散射研究”Jpn.J.Appl.Phys.Suppl.37-1。
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IKUSHIMA Akira J.其他文献
IKUSHIMA Akira J.的其他文献
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{{ truncateString('IKUSHIMA Akira J.', 18)}}的其他基金
Development of silica glass for 157nm photolithography
开发157nm光刻用石英玻璃
- 批准号:
12355025 - 财政年份:2000
- 资助金额:
$ 18.24万 - 项目类别:
Grant-in-Aid for Scientific Research (A)
Study on structural relaxation in silica glass
石英玻璃结构弛豫的研究
- 批准号:
09640408 - 财政年份:1997
- 资助金额:
$ 18.24万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
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