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Development of depth profile analysis of nano materials using X-ray energy variable XPS

Development of depth profile analysis of nano materials using X-ray energy variable XPS
使用 X 射线能量变量 XPS 进行纳米材料深度剖面分析的进展
批准号:
20510110
负责人:
YOSHIKAWA Hideki
金额:
$3.0万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2008
资助国家:
日本
项目状态:
已结题
起止时间:
2008 至 2010

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中文摘要
翻译
硬X射线光电子能谱(HX-XPS)是在同步辐射装置上利用可变能量硬X射线对纳米材料进行分析的一种新方法。HX-XPS深度剖面分析是一种很有前途的定量无损深度剖面分析技术。为了进一步发展这一技术,必须对影响HX-XPS谱的非对称性参数、发射深度分布函数(EDDF)和能量损失函数进行定量评价。本工作开发了精确的算法,该算法通过结合角分辨和能量分辨的HX-XPS测量、Monte Carlo模拟和REELS分析来评估这些量。以具有核壳结构(核:Ag,壳:聚丁二炔)的纳米粒子为例,成功地进行了HX-XPS分析。
英文摘要
Hard X-ray photoemission spectroscopy (HX-XPS) has been developed for the analysis of nano materials using energy-variable hard X-ray at synchrotron radiation facilities. The depth profile analysis by HX-XPS is promising as a quantitative nondestructive depth profile technique. For the further development of this technique, the asymmetry parameter, the emission depth distribution function (EDDF) and energy loss function which govern the HX-XPS spectra should be evaluated quantitatively. This work developed the precise algorism which evaluates these quantities by the combination of the angle-resolved&energy-resolved HX-XPS measurements, Monte Carlo simulation and REELS analysis. As an example, HX-XPS analysis of nano particles, which has core-shell structure (core : Ag, shell: polydiacetylene), has been carried out successfully.
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Energy loss functions and optical constants of a few semiconductors determined by factor analysis of reflection electron energy loss spectra
反射电子能量损失谱因子分析确定几种半导体的能量损失函数和光学常数
DOI: --
发表时间: 2010
期刊:
影响因子: --
作者: [H.Yoshikawa, H.Jin, H.Shinotsuka, H.Iwai, M.Arai, S.Tougaard, S.Tanuma]
通讯作者: S.Tanuma
Hard X-ray Photoelectron Spectroscopy and XANES Analyses of Core (Silver)-Shell (Polydiacetylene) Type Hybridized Nanocrystals
核(银)壳(聚二乙炔)型杂化纳米晶的硬X射线光电子能谱和XANES分析
DOI: --
发表时间: 2009
期刊:
影响因子: --
作者: [H.Yoshikawa, A.M.Vlaicu, M.Kimura, A.Masuhara, S.Tanuma, H.Nakanishi, H.Oikawa]
通讯作者: H.Oikawa
First principle calculation of the optical constants in a wide energy range for III-V semiconductors
III-V族半导体宽能量范围内光学常数的第一原理计算
DOI: --
发表时间: 2010
期刊:
影响因子: --
作者: [H.Shinotsuka, M.Arai, H.Yoshikawa, S.Tanuma]
通讯作者: S.Tanuma
DOI: 10.1380/ejssnt.2009.711
发表时间: 2009-06
期刊: E-journal of Surface Science and Nanotechnology
影响因子: 0.7
作者: [H. Yoshikawa;A. Vlaicu;M. Kimura;A. Masuhara;S. Tanuma;H. Nakanishi;H. Oikawa]
通讯作者: H. Yoshikawa;A. Vlaicu;M. Kimura;A. Masuhara;S. Tanuma;H. Nakanishi;H. Oikawa
共 11 条
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    海外基金