A Versatile High-resolution X-ray Diffractometer for Materials Research

该项目的目的是建立一个最先进的三轴X射线衍射设施，能够对澳大利亚所有的半导体生长小组研究的复杂半导体材料和结构进行非破坏性分析。 种植者和器件工程师将能够准确地控制生长过程，并将器件性能与结构分析相关联。现代三轴仪器也可用于高分辨率纹理分析和多种类型材料的表面反射率测量。 因此，化学家，地质学家和材料科学家的利益以外的半导体生长社区将获得实质性的好处，从这个仪器的调查材料的技术和经济的重要性。

The aim of this project is to establish a state-of-the-art triple-axis x-ray diffraction facility capable of non-destructively analysing complex semiconductor materials and structures investigated by all Australian semiconductor-growing groups. Growers and device engineers will be able to control growth processes accurately and correlate device performance with structural analysis. Modern triple-axis instruments can also be used for high-resolution texture analysis and surface reflectivity measurements on numerous types of materials. Thus chemists, geologists, and materials scientists with interests outside of the semiconductor growth community will gain substantial benefit from this instrument for the investigation of materials of technological and economic importance.