Development of novel mechano-luminesence thin film.

Mn掺杂ZnS是一种很有前途的应力致发光材料。本文研究了用沉积方法制备ZnS:Mn薄膜的可行性，以及沉积薄膜的微观结构与光致发光行为的关系。对ZnS:Mn粉末进行了各种应力条件下的力学试验。ZnS:Mn粉末包埋在环氧树脂中的混合物表现出光致发光（PL）和机械致发光（ML），且集中加载条件增强了机械致发光的强度。对于离子束溅射沉积ZnS薄膜，由于靶材料的离子性极化电荷，需要使用中和离子束。在ZnS和Si衬底之间添加Cu缓冲层，可以减少沉积过程中和沉积后薄膜的开裂和剥落。x射线反射意味着薄膜和衬底之间晶格不匹配引起的界面应力的调节。然而，IBS和电阻热沉积法很难观察到沉积膜的PL行为。这可能是由于在Ar气氛中随后的热处理提供了PL，因此在取代晶格点处膜内Mn的含量不足。

Mn doped ZnS is promising for the stress induced light emitting material. The present work examined the feasibility of production of ZnS:Mn film by deposition methods, and the photoluminescence behaviors with related to the microstructure of deposited film. The mechanical tests under various stress conditions have been conducted for ZnS:Mn powder. The mixture of ZnS:Mn powder embedded in epoxy shows photo-luminescence (PL) and mechano-luminescence (ML), and the magnitude of ML is enhanced by the concentrated loading condition. Regarding to the ion beam sputtering deposition of ZnS film, neutralized ion beam is required because the polarization charge of ionic nature of target matetial. The clack and peeling of the film during and after deposition can be reduced by intermediate Cu buffer layer between ZnS and Si substrate. X-ray reflection implies the accommodation of interfacial stress caused by lattice mismatch between films and substrate. However, PL behavior is hardly observed in deposited films by IBS and also the resistive heat deposition method. This might be due to the contents of Mn inside the film is insufficient at the substitutional lattice points since subsequent heat treatment in Ar atmosphere provides PL.