Quantitative evaluation and active control of tritiumrecycling in the plasma facing materials during mixed ion implantations

本研究对混合离子注入等离子体材料表面氚的回收进行了定量评价。为了提出包含材料效应的氚回收模型，阐明了氚回收与材料辐照损伤的关系。研究了氢离子注入过程中氘在钨(W)中的保留行为以及碳注入W、HOPG和WC的溅射行为。

In this study, the quantitative evaluation of tritium recycling on the surface of plasma facing materials under the mixed ion implantations was performed. To propose tritium recycling model including the effect of materials, correlation between tritium recycling and irradiation damage of materials was elucidated. Deuterium retention behaviors in the tungsten(W) and sputtering behaviors for the carbon implanted W, HOPG and WC during hydrogen ion implantation were evaluated.