Elucidation of Removal Process of Oxide Layer using High Speed Spectroscopic Measurement

利用该研究代表研制的分束带滤波和等离子体图像处理的二维高速光谱测量系统，阐述了高速光谱测量真空电弧中氧化层的去除过程。期望从这一阐释中获得高速去除氧化层的方法。具体地说，用上述方法阐明了氧化层去除时的滞留时间、轨迹和蒸汽种类等去除过程，进而阐明了快速去除氧化层的条件。因此，去除氧化层需要一段时间，而这段时间取决于比热和导热系数。因此，适当的滞止时间汽量值对于维持和移动真空电弧是非常重要的。该技术与开发的氧化层高速去除工艺方法的知识将应用于3R的社会需求。

The removal process of oxide layer in the vacuum arc using high speed spectroscopic measurement was elucidated by using the 2D high speed spectroscopic measurement system with beam splitter and band path filter and plasma image processing developed by this research representative. It is expected that the method of high speed oxide layer removal is obtained from this elucidation. Concretely, the removal process such as stagnation time, track, and species of vapor at oxide layer removal is elucidated with the above method, and then, the condition for fast oxide layer removal is elucidated. As a result, it takes a time for removing the oxide layer, and this time depends on the specific heat and thermal conductivity. Thus, the appropriate vapor amount value of stagnation time is important to maintain and move the vacuum arc. This technology with the knowledge for development of method of high speed removal process of oxide layer will be applied for the social needs of 3R.