课题基金 / 基金详情

A New Reactive Sputtering Using Square Wave Reactant Gas Flow

A New Reactive Sputtering Using Square Wave Reactant Gas Flow
利用方波反应气流的新型反应溅射
批准号:
09650729
负责人:
HONDA Takuya
金额:
$2.24万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1998

项目摘要

项目成果

HONDA Takuya的其他基金

相关文献

中文摘要
翻译
本研究的目的是利用化学反应的非线性特性,开发一种高效可控的新型反应溅射系统。实验方法是一种调制,其中附加的反应物气体流作为方波形式调制到支持溅射的气体上。该工艺减少了反应气体对靶材的中毒作用,提高了沉积速率和工艺的可控性。1997年,在不锈钢衬底上沉积氮化钛。沉积速率增加10 ~ 20%,与沉积的顺序有很大关系。这一结果表明了一种新的动力学分析方法的可能性。1998年,通过功能梯度材料(FGM)等两种不同成分的介质层,在铁衬底上沉积了类金刚石碳(DLC)薄膜。DLC薄膜已经在市场上生产,但需要更强的粘性,以获得更高的速度和更光滑的刀具表面。类fgm涂层具有更强的热应力电阻率。我们找到了精细控制沉积成分的实验条件,制作了三层涂层基板,并观察了其成分分布。
英文摘要
The aim of this research is the development of a new reactive sputtering system with high efficiency and controllability utilizing non-linearity of chemical reactions. The experimental method is one of the modulation where an additional reactant gas flow is modulated as a square wave form onto the sputter-supporting gas. This process reduces the poisoning effects on target by reactive gases and promotes the deposition rate and controllability of the process.In 1997, titanium nitride was deposited on stainless steel substrate. The deposition rates showed 10-20 % increase and depends greatly on the reaction order of the deposition. This results indicates possibility of a new kinetic analysis.In 1998, diamondilke carbon (DLC) films were deposited on Fe substrates through two medium layers which have two different compositions like functionally gradient materials (FGM). DLC films are already produced on market, but stronger stickiness is desired for higher speed and more smooth surface for cutting tool. FGM-like coating promises stronger resistivity to thermal stress. We found out the experimental conditions for fine control of deposition composition, produced the three-layer coated substrates, and observed the composition profiles.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
Progress of Globalization in Higher Education
Development of Equipment Generating Ultra-fine particle for Functionally Gradient Materials.
  • 批准号:
    02453110
  • 项目类别:
    Grant-in-Aid for General Scientific Research (B)
  • 资助金额:
    $4.42万
  • 财政年份:
    1990
  • 负责人:
    HONDA Takuya
  • 依托单位: