Monitoring and Control of Vacuum Deposition and Surface Treatment Processes

Gencoa有限公司已经开发出一种原型传感器，其功能是在真空中产生小的等离子体，并通过CCD光谱仪将发射的光分成其光谱。通过分析该光谱，可以识别真空中存在的物质。这种方法虽然不像RGA那样敏感，但可以在宽的压力范围内工作，而不需要差压泵送。该项目旨在证明使用这种传感方法来识别真空沉积和表面处理工艺的相关污染物，废水和工艺气体种类的可行性。如果该项目证明是成功的，那么它将大大降低进入壁垒，监测真空环境的大量过程操作员谁没有这种能力，由于成本，复杂性和操作范围，目前在市场上。通过更好地监测真空度，该项目旨在证明有可能减少工艺报废和工艺时间，并提高工艺质量和产量

Gencoa Limited have developed a prototype sensor that functions by generating a small plasma within the vacuum and splitting the emitted light into its spectrum via a CCD spectrometer. By analysing this spectrum it is possible to identify species present within the vacuum. This approach, whilst not as sensitive as an RGA, operates over a wide pressure range without the need for differential pumping. This project will aim to demonstrate the feasibility of using this sensing method to identify relevant contaminant, effluent and process gas species for vacuum deposition and surface treatment processes. If the project proves successful, then it would significantly reduce the barrier to entry for monitoring the vacuum environment for a large number of process operators who do not have this capability due to the cost, complexity and operating range of what is currently available on the market. Through better monitoring of the vacuum, this project will aim to demonstrate there is the potential to reduce process scrappage and process time and increase process quality and yield