Next generation material imaging, spectrometry and fabrication techniques

该项目旨在解决限制质谱仪和高分辨率电子显微镜性能的一个共同的、根本的问题：由于电子碰撞而导致的意外化学反应造成的表面改性。预期的项目成果将促进目前对表面电子结构的理解，并为下一代材料成像、光谱分析和制造技术打开大门。它将开发一种用于质谱学的高级探测器，并提高最先进的电子显微镜的成像和纳米制造能力。

This project aims to solve a common, fundamental problem limiting the performance of mass spectrometers and high resolution electron microscopes: surface modification caused by unintended chemical reactions due to electron impact. The intended project outcomes will advance current understanding of electron restructuring of surfaces and open the door to next-generation material imaging, spectrometry and fabrication techniques. It will develop a superior detector for mass spectrometry and improve the imaging and nanofabrication capabilities of state-of-the-art electron microscopes.