Underpinning Equipment Enhancing Semiconductor Characterisation Capabilities in the EPSRC National Epitaxy Facility

国家外延设施需要设备来提升其科学能力，并提高设施的效率，以满足用户的需求。该工厂将安装一个新的低温恒温器，允许安装直径达3英寸的全外延晶片。低温恒温器将与现有设备相结合，创建一个低温光致发光（PL）测绘系统，能够在整个3英寸晶圆上生成PL地图，空间分辨率低至微米级。此外，我们将安装一个时间分辨光子计数系统，以允许在整个晶圆上进行连续波和时间分辨发射特性的映射。该设备将通过增加我们可用的表征数据的范围和质量，提高国家外延设施提供的外延服务的效率，并允许在一次运行中完成低温晶圆映射，而不是在小切割样品上多次运行。新的科学能力也将被实现，特别是在制造研究等领域，外延片空间变化的详细信息是至关重要的。

The National Epitaxy Facility requires equipment to upgrade its scientific capabilities and to improve the efficiency of the facility in meeting user needs.The facility will install a new cryostat that will allow the mounting of full epitaxial wafers up to 3" in diameter. The cryostat will be combined with existing equipment in the facility to create a low temperature Photoluminescence (PL) mapping system capable of producing PL maps over the full 3" wafer, with spatial resolution down to the micron level. In addition, we will install a time-resolved photon counting system to allow for both CW and time-resolved mapping of emission characteristics over full wafers.The equipment will improve the efficiency of the epitaxy service provided by the National Epitaxy Facility by increasing the range and quality of characterisation data available to us and allowing cryogenic wafer mapping to be done in a single run, instead of multiple runs on small cleaved samples.New scientific capabilities will also be enabled , particularly in areas such as manufacturing research where detailed information on spatial variations across epitaxial wafers is of critical importance.