A National Research Facility for Epitaxy

国家外延研究设施

• 批准号: EP/X015300/1
• 负责人: Jon Heffernan
• 金额: $ 1560.96万
• 依托单位: University of Sheffield
• 依托单位国家: 英国
• 项目类别: Research Grant
• 财政年份: 2022
• 资助国家: 英国
• 起止时间: 2022 至 无数据
• 项目状态: 未结题
• 来源: https://gtr.ukri.org/projects?ref=EP%2FX015300%2F1
• 关键词: National; Research; Facility; Epitaxy

We offer a wide-ranging National Research Facility for Epitaxy to EPSRC and its user groups in response to the 2020 Community Statement of Need (SoN). The Facility will be modelled on the existing National Epitaxy Facility (NEF) but will include new capabilities in response to community needs; including new materials and heterogeneous integration.VISION: Our vision is that the National Facility for Epitaxy will be a world-leading centre for advanced epitaxy. It will play a pivotal role supporting the entire UK research community in creating transformative research that will underpin technologies of the 21st century. We will support UK research to be a global lead in Compound Semiconductor Technologies, and to address areas of critical importance to the UK economy such as Net Zero, Electrification, Telecommunications, Healthcare, Security and Quantum Technologies.THE FACILITY: The Facility will provide the highest quality III-V and Group-IV epitaxy to users, enabling them to compete at the highest levels on the world-stage in these exceptionally active fields. With an ISO9001 certified management structure, the Facility will provide up to 790 epitaxial wafers per annum to users, with capacity to deliver twice this level if required. The capabilities will be delivered with a comprehensive suite of six molecular beam epitaxy (MBE) systems and five metal-organic vapour phase epitaxy (MOVPE) reactors, all of which are fully operational, and seamlessly available from the Facility start date in July 2022. The Facility will also expand beyond the current capabilities of the NEF by providing emerging materials through an expanded pump-priming scheme working closely with a wide range of epitaxial groups around the UK. Materials provided will include Ga2O3, II-VIs, SiC, h-BN, III-VIs, and 2D materials. There will be provision of a comprehensive suite of characterisation techniques for all materials from the Facility and we will also install the first commercial Transfer Print Tool in the UK, providing a new capability to users in the strategically important area of heterogeneous integration. MANAGEMENT: The Facility will be led by an experienced Director, Professor Jon Heffernan at the University of Sheffield. He will have ultimate responsibility for delivery of the Facility service and will be supported by a management team with a track record in innovative epitaxy and the running of epitaxy services in the UK. The team will include an Operations Manager, a Research Director, a Director of Epitaxy and Professorial-level team leaders at the two University partners. The Facility will have a strong and effective governance structure based on scheduled Operations and Management committees plus an external steering committee that will include academic, industrial and EPSRC members. There will be an independent pump-priming committee overseeing the allocation of funds for pump priming applications from researchers in the community. LEADERSHIP: Beyond the core provision of materials, the Facility will play a critical role as a national centre of excellence. It will provide centralised leadership and facilitation to the community, it will invest in training and skills development for future experts in epitaxy and materials, will provide leadership in knowledge transfer to industry, and it will be a leading advocacy voice for semiconductors and epitaxy in the UK, including to government.

我们为EPSRC及其用户群体提供广泛的国家研究设施，以响应2020年社区需求声明（SoN）。该基金将仿照现有的国家外延基金（NEF），但将包括新的能力，以满足社区的需求，包括新材料和异构整合。愿景：我们的愿景是，国家外延基金将成为世界领先的先进外延中心。它将在支持整个英国研究界创造变革性研究方面发挥关键作用，这些研究将支撑21世纪的技术。我们将支持英国研究成为化合物半导体技术的全球领先者，并解决对英国经济至关重要的领域，例如净零排放、电气化、电信、医疗保健、安全和量子技术。该设施：该设施将为用户提供最高质量的III-V族和IV族外延，使他们能够在这些异常活跃的领域中在世界舞台上的最高水平上竞争。通过ISO9001认证的管理结构，该工厂每年将向用户提供多达790片外延片，如果需要，可以提供两倍的水平。这些能力将通过一套由六个分子束外延（MBE）系统和五个金属有机气相外延（MOVPE）反应器组成的综合套件来提供，所有这些系统都已全面投入使用，并从2022年7月设施开始无缝可用。该设施还将通过与英国各地广泛的外延集团密切合作，通过扩大泵启动计划提供新兴材料，扩大NEF目前的能力。提供的材料将包括Ga 2 O3、II-VI、SiC、h-BN、III-VI和2D材料。将为该设施的所有材料提供一套全面的表征技术，我们还将在英国安装第一个商业转印工具，为具有重要战略意义的异构集成领域的用户提供新的能力。管理：该设施将由一位经验丰富的主任，谢菲尔德大学的乔恩·赫南教授领导。他将最终负责提供设施服务，并将得到一个管理团队的支持，该团队在创新外延和英国外延服务的运行方面有着良好的记录。该团队将包括运营经理、研究总监、外延总监以及两所大学合作伙伴的教授级团队负责人。该基金将拥有一个强大而有效的治理结构，其基础是预定的运营和管理委员会，以及一个外部指导委员会，其中包括学术界、工业界和EPSRC成员。将有一个独立的泵启动委员会监督分配资金的泵启动申请的研究人员在社区。领导作用：除了提供核心材料外，该基金还将作为国家英才中心发挥关键作用。它将为社区提供集中的领导和便利，它将投资于外延和材料未来专家的培训和技能发展，将在向行业转移知识方面发挥领导作用，它将成为英国半导体和外延的主要倡导声音，包括政府。