Beyond direct-write: Dynamically reconfigurable holographic multibeam interference lithography for high-throughput nanomanufacturing

该项目旨在开发一种新的动态光刻技术的实验室实现，称为“全息多光束干涉光刻（HMBIL）”。这种新技术将结合干涉光刻（例如[1]）和全息预成形光束[2]的优点。与传统的干涉光刻技术（仅限于周期性图案）不同，HMBIL有望实现任意形状特征的图案。所提出的技术也将实现与干涉光刻相当的写入速度，我们的目标是在1小时内写入bb0 25平方厘米的器件面积，分辨率低至100纳米。以如此快的写入速度实现任意形状的纳米级特征是当前直接写入技术（例如激光直接写入）无法实现的，并且在新兴电子和光子系统的制造中提出了一个关键的未满足需求。本博士项目旨在通过开发HMBIL来解决这一需求。作为原理验证，该项目将展示HMBIL制造示例器件结构的能力：多光谱滤波器阵列。当与图像传感器集成时，这些滤光片阵列将允许获取光谱，用于从医学成像到遥感等各种应用。HMBIL制造的多光谱滤波器阵列将为安全、工业或医疗应用的定制探测器和成像传感器开辟一系列途径。

This project aims to develop a laboratory implementation of a new dynamic lithography technique, named "holographic multibeam interference lithography (HMBIL)." This new technique will combine the advantages of interference lithography (e.g. [1]) with holographically pre-shaped beams [2]. Unlike traditional interference lithography - which is limited to periodic patterns - HMBIL is anticipated to enable the patterning of arbitrarily-shaped features. The proposed technique will also achieve comparable write-speeds to interference lithography, with our target to write >25 cm2 device area in under 1 hour with resolution down to 100 nm. Achieving arbitrarily shaped nanoscale features with such fast write-speeds is unachievable with current direct-write technologies (e.g. laser direct-write), and presents a key unmet need in the manufacture of emerging electronic and photonic systems. This PhD project aims to address this need by developing HMBIL. As a proof-of-principle, the project will demonstrate the capability of HMBIL for manufacturing an example device structure: multispectral filter arrays. These filter arrays, when integrated with an image sensor, will allow the acquisition of light spectra for applications as diverse as medical imaging to remote sensing. HMBIL manufacture of multispectral filter arrays will open up a range of avenues for custom detectors and imaging sensors for security, industrial or medical applications.