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Advanced Topological materials for Plasmonics

Advanced Topological materials for Plasmonics
用于等离子体激元的先进拓扑材料
批准号:
2751065
负责人:
金额:
$0.0万
依托单位:
依托单位国家:
英国
项目类别:
Studentship
财政年份:
2022
资助国家:
英国
项目状态:
未结题
起止时间:
2022 至 --

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中文摘要
翻译
等离子体激元包括将光限制在纳米尺度的结构中,作为电子的集体激发。开发基于等离子体激元的下一代器件在通信、高速计算和量子光学等领域具有重要的技术应用。特别令人感兴趣的是表面等离子体激元,它们以表面波的形式传播,对当地环境特别敏感,使它们在传感器和通信中有用。通常,等离子体元材料是通过在一层高导电金属(如金)上蚀刻图案来创建的。周期模式允许操纵关键参数,如介电常数,并产生自然界中看不到的效果。最近,在拓扑绝缘子中观察到了一种新的表面等离子激元。这些合金具有独特的性质,具有拓扑表面状态。这些狄拉克等离子体模具有较低的损耗和自旋与动量之间的耦合,这可能在自旋电子学和量子计算中有重要的应用。可以使用某些表面涂层和掺杂剂,包括有机分子来操纵这些模式。该项目将开发一种从拓扑绝缘体中创建等离子体超材料的新方法。我们不会使用传统的光刻技术在材料中创建周期性图案,而是将使用有机涂层和离子掺杂的组合来创建拓扑表面状态被带隙的区域。它不是作为真空区和导电面的区域存在,而是作为不同拓扑特征的区域之间的对比而存在。除了在一类奇异的材料中探索新的等离子体物理外,该项目还将开发开发超材料的新技术,这将对该领域产生重大影响。成功的候选人将使用亨利·罗伊斯沉积系统开发这些材料,这是利兹大学的世界领先系统,并将与曼彻斯特大学合作使用pname系统开发图案化方法。他们将发展一系列在光刻和材料生长方面的可转移技能,以及对电子显微镜、电子、光学和太赫兹表征技术的理解。
英文摘要
Plasmonics involves confining light to nanoscale structures as a collective excitation of electrons. Developing next generation devices based on plasmonics has important technological applications in communications, high-speed computing and quantum optics. Of particular interest are surface plasmon polaritons, which propagate as a surface wave and are particularly sensitive to their local environment, making them useful in sensors and communications. Typically, plasmonic meta-materials are created by etching patterns into a layer of highly conducting metal, such as gold. The periodic pattern allows critical parameters, such as the permittivity, to be manipulated and produce effects not seen in nature. Recently, a new form of surface plasmon was observed in topological insulators. These are alloys that possess topological surface states with unique properties. These Dirac plasmon modes exhibit lower losses, and coupling between spin and momentum which may have important applications in spintronics and quantum computing. These modes can be manipulated using certain surface coatings and dopants, including organic molecules. This project will develop a new method for creating plasmonic meta-materials from topological insulators. Rather than using conventional lithography to create periodic patterns in the material, we will use a combination of organic coatings and ion doping to create regions where the topological surface state is gapped. Instead of the pattern existing as regions of vacuum and conducting surface, it exists as a contrast between regions with different topological character. As well as exploring novel plasmon physics in an exotic class of materials, this project will also develop new techniques for developing meta-materials, which will have a significant impact on the field. The successful candidate will develop these materials using the Henry Royce Deposition System, a world leading system at the University of Leeds, and will develop the patterning methods in collaboration with the University of Manchester using the pNAME system. They will develop a range of transferable skills in lithography and materials growth, as well as an understanding of electron microscopy, electronic, optical and terahertz characterisation techniques.
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