Molecular inking and printing on silicon

这一战略项目旨在开发一种在硅表面上控制印记稳定分子尺度图案的方法。该方法体现在授予该实验室的四项国际专利中(三项已获，一项正在申请中)。在这种微型化的终极纳米尺度上，面具和人工操作都不实用，相反，体现图案的“墨水”必须自我组装。因此，该项目的第一部分寻求物理吸附(即松散附着)的墨水在硅上的图案化自组装的新方法。第二部分解决了随后的问题，即通过热、光或电子诱导的“局部”化学反应，将这些可移动的分子尺度图案或其反应产物永久地附着在下面的表面上。第一部分和第二部分共同构成了一种用于纳米图形制作的新型‘印刷机’，这是实现和制造纳米电路的基本步骤。

This Strategic Project is directed toward the development of a method for the controlled imprinting of stable molecular-scale patterns on silicon surfaces. The method is embodied in four international patents (three issued, one pending) awarded to this laboratory. At this ultimate nano-scale of miniaturization neither masks nor manual manipulation are practical, instead, the 'ink' that embodies the pattern must be self-assembled. Accordingly, part I of this project seeks novel means for the patterned self-assembly of physisorbed (i.e., loosely attached) inks on silicon. Part II addresses the subsequent problem of permanently attaching these mobile molecular-scale patterns or their reaction-products to the underlying surface by means of 'localized' chemical reactions, induced by heat, light or electrons. Parts I and II taken together constitute a novel 'printing press' for nano-patterning, a fundamental step toward the realization and manufacture of nano-circuitry.