Novel Thin Film Biomaterials for Tissue Engineering

自20世纪60年代以来，通过使用“冷”（非平衡）低压（LP）等离子体的薄膜沉积和蚀刻在信息技术中取得了突出成就。这两个过程和第三个过程，聚合物的表面改性，现在也被用于许多其他行业。最近，在实施大气压（AP）冷等离子体，主要是介质阻挡放电（DBD）品种，这三个过程类别已经取得了很大的进展。除了直接使用LP和AP等离子体之外，还可以通过真空紫外（VUV，λ = 200 nm）光化学来进行这样的过程，因为商业（基于等离子体的）VUV源可以有效地将电能转换成短波长光子。（单能）光化学相对于（LP-和AP-）等离子体的潜在优点是前者可导致更具靶向的反应，具有更高的所需产物产率。多年来，申请人的实验室对上述所有类型（LP、AP、VUV）的研究已经产生了400多篇参考出版物、20多项专利，并向工业界转让了许多技术。他提出了创新的研究重点是新的AP等离子体技术和沉积在合适的基板上的有机薄膜，用于生物技术（如组织工程）的应用。这种涂层必须富含某些类型的化学官能团，例如伯胺（-NH

Deposition of thin films and etching via the use of “cold” (thermodynamically non-equilibrium) low-pressure (LP) plasmas achieved prominence in information technology since the 1960s. Those two processes and a third, surface modification of polymers, are now also being used in many other industries. Recently, there has been much progress in implementing atmospheric-pressure (AP) cold plasmas, mostly the dielectric barrier discharge (DBD) variety, for those three process categories. Beside direct use of LP and AP plasmas, it is also possible to carry out such processes by vacuum-ultraviolet (VUV, lambda = 200 nm) photo-chemistry, since commercial (plasma-based) VUV sources can efficiently convert electrical energy into short-wavelength photons. A potential advantage of (mono-energetic) photo- chemistry over (LP- and AP-) plasma is that the former may result in more targeted reactions, with higher yields of the desired products. Research in the applicant’s laboratory of all types (LP, AP, VUV) above has over the years resulted in well over 400 refereed publications, in two dozen patents, and in much technology transfer to industry. He proposes innovative research focused on novel AP plasma techniques and on thin organic films deposited on suitable substrates for use in bio-technological (e.g. tissue engineering) applications. Such coatings must be rich in certain types of chemical functionalities, for example in primary amines (-NH