A purification process for new precursors for atomic layer deposition (ALD)
A purification process for new precursors for atomic layer deposition (ALD)
批准号:
536231-2018
负责人:
Ivey, Douglas
金额:
$1.82万
依托单位:
依托单位国家:
加拿大
项目类别:
Engage Grants Program
财政年份:
2018
资助国家:
加拿大
项目状态:
已结题
起止时间:
2018-01-01 至 2019-12-31
中文摘要
该项目涉及艾伯塔大学化学与材料工程系的研究人员和Seastar化学公司的技术人员之间的合作。主要目标是开发和测试用于原子层沉积(ALD)的新的高纯度前体化学品的扩大纯化工艺。ALD是一种用多种材料制备超薄薄膜的高精度方法,在半导体工业中得到了广泛的应用。这项研究将把计算机模拟和实验测试结合起来,目的是在Seastar化工公司设计和建造一个中试规模的间歇填充精馏塔。
英文摘要
This project involves a collaborative effort between research staff in the Department of Chemical and Materials Engineering at the University of Alberta and technical staff at the Seastar Chemicals Inc. The major goal is to develop and test a scaled-up purification process for new high purity precursor chemicals that are utilized for atomic layer deposition (ALD). ALD is a high precision method to fabricate extremely thin films of a variety of materials and is widely used in the semiconductor industry. The research will combine computer simulations with experimental testing, with the aim of designing and building a pilot scale, batch packed distillation column at Seastar Chemicals Inc.**
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