Analytical models for the base transit time of a bipolar transistor with double base epilayers

Analytical models for the base transit time of a bipolar transistor with double base epilayers
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双基极外延层双极晶体管基极渡越时间的分析模型

DOI:
10.1088/1674-4926/30/9/094003
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发表时间:
2009-09
影响因子:
5.1
通讯作者:
Zhang, Yimen
Zhang, Yimen
中科院分区:
物理与天体物理4区
文献类型:
--
作者:
Zhang, Qian;Zhang, Yuming;Zhang, Yimen

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根据漂移扩散理论,构造了双基区外延层的掺杂分布函数。然后根据4H-SiC材料的特性和4H-SiCBJTS的工作原理,建立了小能级注入情况下基区渡越时间b的解析模型。基于二维仿真模型对该装置进行了数值模拟和验证。结果表明,双基区外延层结构产生的内建电场可以加速载流子穿越基区,缩短基区渡越时间。从仿真结果来看,当L2/L1的比值约为2时,基本渡越时间达到最小值。
The doping profile function of a double base epilayer is constructed according to drift-diffusion theory. Then an analytical model for the base transit time b is developed assuming a small-level injection based on the characteristics of the 4H-SiC material and the principle of the 4H-SiC BJTs. The device is numerically simulated and validated based on two-dimensional simulation models. The results show that the built-in electric field generated by the double base epilayer configuration can accelerate the carriers when transiting the base region and reduce the base transit time. From the simulation results, the base transit time reaches a minimal value when the ratio of L2/L1 is about 2.
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