Metallic ferromagnetic films with magnetic damping under 1.4 × 10(-3).
Metallic ferromagnetic films with magnetic damping under 1.4 × 10(-3).
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DOI：
10.1038/s41467-017-00332-x
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发表时间：
2017-08-10
影响因子：
16.6
通讯作者：
Yang F
中科院分区：
文献类型：
--
作者：
Lee AJ;Brangham JT;Cheng Y;White SP;Ruane WT;Esser BD;McComb DW;Hammel PC;Yang F
低阻尼磁性材料由于其低能量损耗和高灵敏度而在微波和自旋电子学领域得到了广泛的应用。虽然吉尔伯特阻尼常数在一些绝缘铁磁体中可以达到10−4到10−5，但金属铁磁体通常由于传导电子的磁振子散射而具有更大的阻尼。同时，低阻尼的金属铁磁体被期望用于基于电荷的自旋电子器件。在这里，我们报告的生长Co25Fe75外延薄膜具有良好的结晶质量明显的清晰劳厄振荡和异常狭窄的摇摆曲线的X射线衍射扫描，以及从扫描透射电子显微镜。值得注意的是，Co25Fe75外延薄膜的阻尼常数<1.4 × 10−3，与一些高质量的Y3Fe5O12薄膜的阻尼常数相当。金属铁磁体的这种创纪录的低阻尼为基于电荷的应用提供了新的机会，例如自旋转移转矩感应开关和磁振荡。由于它们的导电性，低阻尼金属铁磁体在基于电荷的自旋电子器件中比绝缘铁磁体更受欢迎，但尚未得到很好的开发。在这里，作者实现了低磁阻尼CoFe外延膜，这是传统的绝缘铁磁YIG薄膜相媲美。
Low-damping magnetic materials have been widely used in microwave and spintronic applications because of their low energy loss and high sensitivity. While the Gilbert damping constant can reach 10−4 to 10−5 in some insulating ferromagnets, metallic ferromagnets generally have larger damping due to magnon scattering by conduction electrons. Meanwhile, low-damping metallic ferromagnets are desired for charge-based spintronic devices. Here, we report the growth of Co25Fe75 epitaxial films with excellent crystalline quality evident by the clear Laue oscillations and exceptionally narrow rocking curve in the X-ray diffraction scans as well as from scanning transmission electron microscopy. Remarkably, the Co25Fe75 epitaxial films exhibit a damping constant <1.4 × 10−3, which is comparable to the values for some high-quality Y3Fe5O12 films. This record low damping for metallic ferromagnets offers new opportunities for charge-based applications such as spin-transfer-torque-induced switching and magnetic oscillations. Owing to their conductivity, low-damping metallic ferromagnets are preferred to insulating ferromagnets in charge-based spintronic devices, but are not yet well developed. Here the authors achieve low magnetic damping in CoFe epitaxial films which is comparable to conventional insulating ferromagnetic YIG films.
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影响因子：
4
作者：
d'Allivy Kelly, O.;Anane, A.;Fert, A.
通讯作者：
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影响因子：
56.9
作者：
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作者：
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通讯作者：
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作者：
Meier D;Reinhardt D;van Straaten M;Klewe C;Althammer M;Schreier M;Goennenwein STB;Gupta A;Schmid M;Back CH;Schmalhorst JM;Kuschel T;Reiss G
通讯作者：
Reiss G
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影响因子：
56.9
作者：
Myers, EB;Ralph, DC;Buhrman, RA
通讯作者：
Buhrman, RA