In situ photografting during direct laser writing in thermoplastic microchannels.
In situ photografting during direct laser writing in thermoplastic microchannels.
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DOI:
10.1038/s41598-021-90571-2
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发表时间:
2021-05-26
影响因子:
4.6
通讯作者:
DeVoe DL
中科院分区:
文献类型:
--
作者:
Han JY;Warshawsky S;DeVoe DL
A method for in situ photografting during direct laser writing by two-photon polymerization is presented. The technique serves as a powerful approach to the formation of covalent bonds between 3D photoresist structures and thermoplastic surfaces. By leveraging the same laser for both pattern generation and localized surface reactions, crosslinking between the bulk photoresist and thermoplastic surface is achieved during polymerization. When applied to in-channel direct laser writing for microfluidic device fabrication, the process yields exceptionally strong adhesion and robust bond interfaces that can withstand pressure gradients as high as 7 MPa through proper channel design, photoinitiator selection, and processing conditions.
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