Comparing amorphous silicon prepared by electron-beam evaporation and sputtering toward eliminating atomic tunneling states

Comparing amorphous silicon prepared by electron-beam evaporation and sputtering toward eliminating atomic tunneling states
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比较通过电子束蒸发和溅射制备的消除原子隧道态的非晶硅

DOI:
10.1016/j.jallcom.2020.157431
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发表时间:
2021
影响因子:
6.2
通讯作者:
Hellman, Frances
Hellman, Frances
中科院分区:
材料科学2区
文献类型:
--
作者:
Liu, Xiao;Abernathy, Matthew R.;Metcalf, Thomas H.;Jugdersuren, Battogtokh;Culbertson, James C.;Molina-Ruiz, Manel;Hellman, Frances

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已有研究表明,在高温条件下,非晶硅(a-Si)薄膜可以在无隧道二能级系统(TLS)的情况下通过电子束蒸发在衬底上获得,并且这些薄膜的原子密度与TLS数密度之间存在着强烈的反相关关系。我们用磁控溅射技术在与电子束研究中所用的衬底温度相当的衬底温度下制备了原子密度更高的非晶硅薄膜。我们比较了在低温下用卢瑟福背散射测量的原子密度和用内耗测量得到的剪切模数、声速和TLS密度,并与电子束薄膜进行了比较。我们的结果表明,尽管溅射硅薄膜的原子密度较高,但在较高的衬底温度下制备的薄膜具有较低的声速和较高的TLS密度,这是由于薄膜的生长机制与电子束蒸发不同。我们的结论是,为了消除原子隧穿状态,需要协同改进局域结构和网络连接性,分别由原子密度和声速决定,以接近它们的结晶值。
It has previously been shown that amorphous silicon (a-Si) thin films can be produced free of tunneling two-level systems (TLS) bye-beam evaporation onto substrates held at elevated temperatures, and there appears to be a strong anticorrelation between the atomic density of these films and the number density of TLS. We have prepareda-Si films with higher atomic density using magnetron sputtering at substrate temperatures comparable to those used in thee-beam studies. We compare the atomic densities measured using Rutherford backscattering and the shear moduli, the speeds of sound, and the densities of TLS calculated using internal friction measurements at cryogenic temperatures of sputtereda-Si films to those of thee-beam films. Our results show that despite their higher atomic densities, sputtereda-Si films prepared at elevated substrate temperatures have lower speeds of sound and higher densities of TLS, which we attribute to the different film growth mechanism from that ofe-beam evaporation. We conclude that a collaborative improvement of both local structure and network connectivity, determined by atomic density and speed of sound, respectively, to approach their crystalline values is required to eliminate atomic tunneling states.
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