Comparing amorphous silicon prepared by electron-beam evaporation and sputtering toward eliminating atomic tunneling states
Comparing amorphous silicon prepared by electron-beam evaporation and sputtering toward eliminating atomic tunneling states
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比较通过电子束蒸发和溅射制备的消除原子隧道态的非晶硅
DOI:
10.1016/j.jallcom.2020.157431
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发表时间:
2021
影响因子:
6.2
通讯作者:
Hellman, Frances
中科院分区:
文献类型:
--
作者:
Liu, Xiao;Abernathy, Matthew R.;Metcalf, Thomas H.;Jugdersuren, Battogtokh;Culbertson, James C.;Molina-Ruiz, Manel;Hellman, Frances
It has previously been shown that amorphous silicon (a-Si) thin films can be produced free of tunneling two-level systems (TLS) bye-beam evaporation onto substrates held at elevated temperatures, and there appears to be a strong anticorrelation between the atomic density of these films and the number density of TLS. We have prepareda-Si films with higher atomic density using magnetron sputtering at substrate temperatures comparable to those used in thee-beam studies. We compare the atomic densities measured using Rutherford backscattering and the shear moduli, the speeds of sound, and the densities of TLS calculated using internal friction measurements at cryogenic temperatures of sputtereda-Si films to those of thee-beam films. Our results show that despite their higher atomic densities, sputtereda-Si films prepared at elevated substrate temperatures have lower speeds of sound and higher densities of TLS, which we attribute to the different film growth mechanism from that ofe-beam evaporation. We conclude that a collaborative improvement of both local structure and network connectivity, determined by atomic density and speed of sound, respectively, to approach their crystalline values is required to eliminate atomic tunneling states.
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DOI:
--
发表时间:
1980
期刊:
影响因子:
--
作者:
M. Haumeder;U. Strom;S. Hunklinger
通讯作者:
S. Hunklinger
DOI:
--
发表时间:
1973
期刊:
影响因子:
--
作者:
B. Golding;J. Graebner;B. Halperin;R. J. Schutz
通讯作者:
R. J. Schutz
影响因子:
6.2
作者:
P. Medwick;B. White;R. Pohl
通讯作者:
P. Medwick;B. White;R. Pohl
影响因子:
8.6
作者:
Xiao Liu;B. White;R. Pohl;E. Iwanizcko;Kim M. Jones;A. Mahan;B. N. Nelson;R. Crandall;S. Vepřek
通讯作者:
Xiao Liu;B. White;R. Pohl;E. Iwanizcko;Kim M. Jones;A. Mahan;B. N. Nelson;R. Crandall;S. Vepřek
影响因子:
8.6
作者:
Birney R
通讯作者:
Birney R