Defect-Free Single-Layer Graphene by 10 s Microwave Solid Exfoliation and Its Application for Catalytic Water Splitting.
Defect-Free Single-Layer Graphene by 10 s Microwave Solid Exfoliation and Its Application for Catalytic Water Splitting.
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DOI：
10.1021/acsami.1c03906
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发表时间：
2021-06-23
影响因子：
9.5
通讯作者：
Tang J
中科院分区：
文献类型：
--
作者：
Bayazit MK;Xiong L;Jiang C;Moniz SJA;White E;Shaffer MSP;Tang J
通过具有成本效益的方法大规模生产无缺陷的单层石墨烯薄片（SLGF）仍然非常具有挑战性。在这里，我们报告了通过非破坏性，节能和易于升级的物理方法制备的这种单层石墨烯薄片（SLGF）（>90%）。这些高质量的石墨烯薄片归功于一种新颖的10 s微波调制固态方法，该方法不仅在空气中快速剥离石墨，而且还自修复石墨表面以去除杂质。所制备的高质量石墨烯膜（约200 nm）在没有任何化学或物理后处理的情况下表现出约280 Ω/sq的薄层电阻。此外，与原始Ni-Fe电极（约10 mA/cm 2）相比，石墨烯结合的Ni-Fe电极表现出用于催化水氧化反应的显著约140 mA/cm 2电流，并且在相同的实验条件下起始电位的120 mV阴极偏移，以及对于从水中产生H2和O2的理想比率的>90%的法拉第效率。所有这些优异的性能都归功于无缺陷石墨烯薄片的极高导电性。
Mass production of defect-free single-layer graphene flakes (SLGFs) by a cost-effective approach is still very challenging. Here, we report such single-layer graphene flakes (SLGFs) (>90%) prepared by a nondestructive, energy-efficient, and easy up-scalable physical approach. These high-quality graphene flakes are attributed to a novel 10 s microwave-modulated solid-state approach, which not only fast exfoliates graphite in air but also self-heals the surface of graphite to remove the impurities. The fabricated high-quality graphene films (∼200 nm) exhibit a sheet resistance of ∼280 Ω/sq without any chemical or physical post-treatment. Furthermore, graphene-incorporated Ni–Fe electrodes represent a remarkable ∼140 mA/cm2 current for the catalytic water oxidation reaction compared with the pristine Ni–Fe electrode (∼10 mA/cm2) and a 120 mV cathodic shift in onset potential under identical experimental conditions, together with a faradic efficiency of >90% for an ideal ratio of H2 and O2 production from water. All these excellent performances are attributed to extremely high conductivity of the defect-free graphene flakes.
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影响因子：
8.6
作者：
Garcia-Gallastegui, Ainara;Iruretagoyena, Diana;Shaffer, Milo S. P.
通讯作者：
Shaffer, Milo S. P.
影响因子：
56.9
作者：
Lee, Jae-Hyun;Lee, Eun Kyung;Whang, Dongmok
通讯作者：
Whang, Dongmok
影响因子：
38.3
作者：
Hernandez, Yenny;Nicolosi, Valeria;Coleman, Jonathan N.
通讯作者：
Coleman, Jonathan N.
影响因子：
3.7
作者：
Hwang, J.;Carbotte, J. P.;Tanner, D. B.
通讯作者：
Tanner, D. B.
使用电化学去角质从压缩石墨产生高收益的石墨烯纳米片。
影响因子：
4.6
作者：
Achee TC;Sun W;Hope JT;Quitzau SG;Sweeney CB;Shah SA;Habib T;Green MJ
通讯作者：
Green MJ