Temporal evolution of the radial plasma emissivity profile in HIPIMS plasma discharges
Temporal evolution of the radial plasma emissivity profile in HIPIMS plasma discharges
复制标题
HIPIMS 等离子体放电中径向等离子体发射率分布的时间演化
DOI：
10.1088/0963-0252/21/3/035017
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发表时间：
2012
影响因子：
3.8
通讯作者：
Winter J
中科院分区：
文献类型：
--
作者：
Hecimovic A;De los Arcos T;Schulz-von der Gathen V;Böke M;Winter J
High power impulse magnetron sputtering (HIPIMS) is a plasma vapour deposition technique used for deposition of dense coatings. In order to contribute to a better understanding of the dynamics of a HIPIMS plasma discharge, time-and wavelength-resolved measurements of the light emitted from the plasma were performed. Lateral images of the HIPIMS plasma were recorded using an ICCD camera with a gate width of 1 µs. For each picture, Abel inversion was performed to compute the radial emissivity profile of the plasma. Band-pass interference filters were used to isolate the desired wavelength in order to observe lines of ions and neutrals of metal and argon (Ar) in HIPIMS plasma discharges with an aluminium (Al), titanium (Ti) or chromium (Cr) target in Ar atmosphere. The result is the temporal evolution of the radial emissivity profile of metal and gas neutrals and singly charged ions.
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影响因子：
3.8
作者：
P. Poolcharuansin;J. Bradley
通讯作者：
P. Poolcharuansin;J. Bradley
影响因子：
3.2
作者：
Horwat, David;Anders, Andre
通讯作者：
Anders, Andre
影响因子：
3.2
作者：
A. Ehiasarian;A. Vetushka;A. Hecimovic;S. Konstantinidis
通讯作者：
A. Ehiasarian;A. Vetushka;A. Hecimovic;S. Konstantinidis
低压下预电离 HiPIMS 放电中的等离子体参数
影响因子：
1.5
作者：
P. Poolcharuansin;B. Liebig;J. Bradley
通讯作者：
J. Bradley