Exploratory phase stabilization in heteroepitaxial gallium oxide films by pulsed laser deposition
Exploratory phase stabilization in heteroepitaxial gallium oxide films by pulsed laser deposition
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通过脉冲激光沉积探索异质外延氧化镓薄膜的相稳定性
DOI:
10.1016/j.jallcom.2022.168123
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发表时间:
2022-11
影响因子:
6.2
通讯作者:
Jichun Ye
中科院分区:
文献类型:
--
作者:
Jianguo Zhang;Wei Wang;Simiao Wu;Zhiming Geng;Jinfu Zhang;Li Chen;Ningtao Liu;Xuejun Yan;Wenrui Zhang;Jichun Ye
Gallium oxide (Ga2O3) is featured by various types of polymorphs that exhibit distinct properties for a broad range of applications. Selective stabilization of distinct Ga2O3polymorphs is highly desired, but is usually limited by impurity phase formation. Here we report the controlled growth of metastable gallium oxide films by pulsed laser deposition (PLD), and explore a comprehensive phase evolution picture tuned by key synthesis parameters, substrate orientations, and extrinsic tin (Sn) dopants. We demonstrate the stabilization of both undoped and Sn-dopedα-Ga2O3films by selecting a-plane sapphire substrates, and find that Sn dopants can largely broaden the growth window ofα-Ga2O3. Besides, Sn-dopedε-Ga2O3is more favored thanβ-Ga2O3to be stabilized on c-plane substrates, and the oxygen pressure is the critical factor to dictate theε-Ga2O3formation. The structural impact on the thermal transport among these metastable Ga2O3films is investigated, which shows a maximum value of 5.66 Wm−1K−1inα-Ga2O3and a minimum value of 1.04 Wm−1K−1in amorphous Ga2O3. The native defects of these phases are sensitive to the Sn doping, which exhibits distinct response for deep ultraviolet photodetection. This study establishes a synthesis guideline of metastable Ga2O3polymorphs by PLD and provides insights into selective phase stabilization of transition metal oxides with various crystal phases.
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影响因子:
6.7
作者:
Zhuo Yi;Chen Zimin;Tu Wenbin;Ma Xuejin;Pei Yanli;Wang Gang
通讯作者:
Wang Gang
影响因子:
4
作者:
Xue-Jun Yan;Yang-Yang Lv;Lei Li;Xiao Li;Shu-Hua Yao;Yan-Bin Chen;Xiao-Ping Liu;Hong Lu;Ming-Hui Lu;Yan-Feng Chen
通讯作者:
Yan-Feng Chen
影响因子:
1.5
作者:
Shinohara, Daisuke;Fujita, Shizuo
通讯作者:
Fujita, Shizuo
影响因子:
4
作者:
Wenrui Zhang;Jianguo Zhang;Li Chen;Wei Wang-;Tan Zhang;Ningtao Liu;Tao Xu;Hongxin Yang;Jichun Ye
通讯作者:
Wenrui Zhang;Jianguo Zhang;Li Chen;Wei Wang-;Tan Zhang;Ningtao Liu;Tao Xu;Hongxin Yang;Jichun Ye
影响因子:
2.8
作者:
Guo, Daoyou;Wu, Zhenping;Tang, Weihua
通讯作者:
Tang, Weihua