Architecture design and applications of nanopatterned arrays based on colloidal lithography
Architecture design and applications of nanopatterned arrays based on colloidal lithography
复制标题
基于胶体光刻的纳米图形阵列的架构设计及应用
DOI：
10.1063/1.5120601
复制
发表时间：
2019-10
影响因子：
3.2
通讯作者：
Du Youwei
中科院分区：
文献类型：
--
作者：
Zhao Xiaoyu;Wen Jiahong;Li Lingwei;Wang Yaxin;Wang Dunhui;Chen Lei;Zhang Yongjun;Du Youwei
Nanopatterned arrays have potential applications in diverse devices, including high-density memory, wettability control, electronic chips, biochips, plasmonics (such as plasmon sensors, plasmon-enhanced molecular spectroscopy, and plasmon-mediated chemical reactions), and so on. In this tutorial, we first introduce colloidal lithography (CL) technique as an important method to prepare nanopatterned arrays. Based on the formation of a mask by self-assembly of polystyrene (PS) colloid spheres, the nanopatterned arrays can be achieved by following a series of various deposition, etching, transfer, and their combination steps. According to the structural differences of the acquired surface patterns, diverse nanopatterned arrays are fabricated by controlling the fabrication routes. Technical issues are discussed in detail, such as preparation and modification of the large-area and ordered PS colloid sphere arrays and design and hybridization of nanostructured arrays of films with various shapes. In the meantime, the potential applications of these nanopatterned array films are reviewed and summarized. Hopefully, the present tutorial will inspire more ingenious designs of nanopatterned arrays and developments of using CL technique in potential applications.Nanopatterned arrays have potential applications in diverse devices, including high-density memory, wettability control, electronic chips, biochips, plasmonics (such as plasmon sensors, plasmon-enhanced molecular spectroscopy, and plasmon-mediated chemical reactions), and so on. In this tutorial, we first introduce colloidal lithography (CL) technique as an important method to prepare nanopatterned arrays. Based on the formation of a mask by self-assembly of polystyrene (PS) colloid spheres, the nanopatterned arrays can be achieved by following a series of various deposition, etching, transfer, and their combination steps. According to the structural differences of the acquired surface patterns, diverse nanopatterned arrays are fabricated by controlling the fabrication routes. Technical issues are discussed in detail, such as preparation and modification of the large-area and ordered PS colloid sphere arrays and design and hybridization of nanostructured arrays of films with various shapes. In the meantim...
登录
查看更多内容
影响因子：
3.5
作者：
Ye Yu;Ziwei Zhou;H. Möhwald;Bin Ai;Zhiyuan Zhao;Shunsheng Ye;Gang Zhang
通讯作者：
Ye Yu;Ziwei Zhou;H. Möhwald;Bin Ai;Zhiyuan Zhao;Shunsheng Ye;Gang Zhang
影响因子：
3.7
作者：
Correia-Ledo, Debby;Gibson, Kirsty F.;Dhawan, Anuj;Couture, Maxime;Vo-Dinh, Tuan;Graham, Duncan;Masson, Jean-Francois
通讯作者：
Masson, Jean-Francois
影响因子：
38.3
作者：
通讯作者：
--
影响因子：
19
作者：
Shikuan Yang;W. Cai;Lingce Kong;Y. Lei
通讯作者：
Shikuan Yang;W. Cai;Lingce Kong;Y. Lei
影响因子：
29.4
作者：
Wen Dong;H. Dong;Zhenlin Wang;P. Zhan;Ziqin Yu;Xiaoning Zhao;Yong‐yuan Zhu;N. Ming
通讯作者：
Wen Dong;H. Dong;Zhenlin Wang;P. Zhan;Ziqin Yu;Xiaoning Zhao;Yong‐yuan Zhu;N. Ming