From stannous oxide to stannic oxide epitaxial films grown by pulsed laser deposition with a metal tin target
From stannous oxide to stannic oxide epitaxial films grown by pulsed laser deposition with a metal tin target
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用金属锡靶材进行脉冲激光沉积从氧化亚锡到氧化亚锡外延膜
DOI:
10.1016/j.apsusc.2018.10.043
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发表时间:
2019-02
影响因子:
6.7
通讯作者:
He Yunbin
中科院分区:
文献类型:
--
作者:
Li Mingkai;Zheng Lilan;Zhang Mi;Lin Yinyin;Li Lei;Lu Yinmei;Chang Gang;Klar Peter J.;He Yunbin
Stannous oxide (SnO) and stannic oxide (SnO 2) are both important wide-band-gap semiconductors. To study the conductive mechanism in detail, high quality epitaxial films are essential. Here we propose a simple method to grow high quality epitaxial films of either stannous oxide or stannic oxide on an r-plane sapphire substrate by using pulsed laser deposition with a metallic tin target. The valence state of tin is controlled by tuning the oxygen pressure during the deposition procedure. Metal tin impurities and the transition phase of Sn 3 O 4 are avoided and the growth windows from stannous oxide to stannic oxide are confirmed. For single-crystalline SnO epitaxial film, a rocking curve half-width of 0.22° is obtained, which is better than the 0.46° of that on a YSZ substrate. The minimum roughnesses achieved were 0.37 nm for the SnO 2 epitaxial film and 0.84 nm for the SnO epitaxial film. The epitaxial relationship between SnO and the r-sapphire substrate was determined to be SnO [1¯ 1 0]//sapphire [1¯ 2 1¯ 0] and SnO [1 1 0]//sapphire [1 0 1¯ 1]. For SnO 2, the epitaxial relation is SnO 2 [0 1 0]//sapphire [1¯ 2 1¯ 0] and SnO 2 [1¯ 0 1]//sapphire [1 0 1¯ 1]. The band schematics, deduced by combined XPS valence band spectroscopy and optical transmittance spectroscopy, indicated p-type bands of SnO and n-type bands of SnO 2. Raman spectroscopy is suggested to be a superior fingerprint of SnO single-crystalline quality, due to its greater sensitivity than X-ray diffraction.
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DOI:
10.1209/0295-5075/106/16001
发表时间:
2014-04
期刊:
Europhysics Letters
影响因子:
--
作者:
D. B. Granato;A. Albar;U. Schwingenschlögl
通讯作者:
D. B. Granato;A. Albar;U. Schwingenschlögl
影响因子:
3.2
作者:
J. Perrière;C. Hébert;A. Petitmangin;X. Portier;W. Seiler;M. Nistor
通讯作者:
J. Perrière;C. Hébert;A. Petitmangin;X. Portier;W. Seiler;M. Nistor
影响因子:
3.2
作者:
A. Cabot;J. Arbiol;R. Ferré;J. Morante;F. Chen;Meilin Liu
通讯作者:
A. Cabot;J. Arbiol;R. Ferré;J. Morante;F. Chen;Meilin Liu
DOI:
10.1002/pssa.2210870110
发表时间:
1985-01-01
影响因子:
2
作者:
KRASEVEC, V;PRODAN, A;SULCIC, S
通讯作者:
SULCIC, S
影响因子:
2.1
作者:
Batzill, M;Burst, JM;Diebold, U
通讯作者:
Diebold, U