Effect of Treated Time of Hydrothermal Etching Process on Oxide Layer Formation and Its Antibacterial Properties.
Effect of Treated Time of Hydrothermal Etching Process on Oxide Layer Formation and Its Antibacterial Properties.
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DOI：
10.3390/biomimetics7030091
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发表时间：
2022-07-07
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影响因子：
--
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中科院分区：
文献类型：
--
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Inspired by natural materials, we developed an antibacterial surface on titanium (Ti) using hydrothermal etching techniques and examined the effect of treated time on oxide layer formation, its antibacterial properties, and surface defects. Hydrothermal etching was conducted on Grade 2 commercially pure Ti immersed in 5M NaOH at 250 °C during a range of time of 0–12 h. Nanopillars generated on the surface had ~100 nm thickness, which resulted in decreased attachment and rupturing of the attached bacteria. The results also showed that 6 h and 8 h of etching time provided a desirable uniform nanopillar structure with the most effective prevention of bacterial adherence on the surface. Multiscale SEM observations revealed that the longer the etching was conducted, the more cracks propagated, which led to an increase in dissociated fragments of the oxide layer. In the 12 h of etching, a higher density of bacterial adherence was observed than that of the untreated and the shorter time treated samples, indicating that etching took longer than 10 h worsened the antibacterial properties of the nano-patterned surface of Ti. This study demonstrated that the optimal time duration is 6–8 h for the oxide layer formation to maximize antibacterial activity and minimize cracking formation on the surface. For future studies, we suggest exploring many possible conditions to generate a more uniform nanopattern without structural defects to secure the integration between a newly deposited oxide layer and the substrate.
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影响因子：
16.6
作者：
Jenkins, J.;Mantell, J.;Su, B.
通讯作者：
Su, B.
影响因子：
2
作者：
Hong, EJ;Na, KJ;Jeung, EB
通讯作者：
Jeung, EB
DOI：
10.1002/jbm.b.34762
发表时间：
2020-11-25
影响因子：
3.4
作者：
Elliott, Drew T.;Wiggins, Russell J.;Dua, Rupak
通讯作者：
Dua, Rupak
影响因子：
16.6
作者：
Ivanova, Elena P.;Hasan, Jafar;Webb, Hayden K.;Gervinskas, Gediminas;Juodkazis, Saulius;Vi Khanh Truong;Wu, Alex H. F.;Lamb, Robert N.;Baulin, Vladimir A.;Watson, Gregory S.;Watson, Jolanta A.;Mainwaring, David E.;Crawford, Russell J.
通讯作者：
Crawford, Russell J.
影响因子：
8.6
作者：
Bavykin, Dmitry V.;Carravetta, Marina;Walsh, Frank C.
通讯作者：
Walsh, Frank C.