Batch-fabricated high-performance graphene Hall elements.

Batch-fabricated high-performance graphene Hall elements.
复制标题

DOI:
10.1038/srep01207
复制
发表时间:
2013
期刊:
影响因子:
4.6
通讯作者:
Peng, Lian-Mao
Peng, Lian-Mao
中科院分区:
综合性期刊3区
文献类型:
--
作者:
Xu, Huilong;Zhang, Zhiyong;Shi, Runbo;Liu, Honggang;Wang, Zhenxing;Wang, Sheng;Peng, Lian-Mao

文献摘要

参考文献

被引文献

相似文献

霍尔元件是目前应用最广泛的磁传感器。一般来说,迁移率越高,所用半导体的有源区越薄,霍尔器件的性能越好。虽然最常见的磁场传感器是硅基霍尔传感器,但由III-V化合物制成的器件往往比基于Si的器件更受青睐。然而,这些器件比硅更昂贵,更难以制造,并且难以与信号处理电路集成以扩展功能和增强性能。在本文中,我们表明石墨烯本质上是霍尔元件的理想材料,可以利用石墨烯的显着特性,即极高的载流子迁移率和原子薄的活性体,来制造具有高灵敏度,优良线性和卓越热稳定性的理想磁传感器。
Hall elements are by far the most widely used magnetic sensor. In general, the higher the mobility and the thinner the active region of the semiconductor used, the better the Hall device. While most common magnetic field sensors are Si-based Hall sensors, devices made from III-V compounds tend to favor over that based on Si. However these devices are more expensive and difficult to manufacture than Si, and hard to be integrated with signal-processing circuits for extending function and enforcing performance. In this article we show that graphene is intrinsically an ideal material for Hall elements which may harness the remarkable properties of graphene, i.e. extremely high carrier mobility and atomically thin active body, to create ideal magnetic sensors with high sensitivity, excellent linearity and remarkable thermal stability.
DOI: 10.1007/s10854-007-9408-0
发表时间: 2008-09-01
影响因子: 2.8
作者:
Kunets, Vasyl P.;Dobbert, Julia;Wiebicke, Evi
通讯作者: Wiebicke, Evi
DOI: 10.1016/s0924-4247(03)00192-4
发表时间: 2003-09-15
影响因子: 4.6
作者:
Boero, G;Demierre, M;Popovic, RS
通讯作者: Popovic, RS
DOI: 10.1021/nl903690y
发表时间: 2010-01-01
期刊: NANO LETTERS
影响因子: 10.8
作者:
Pisana, Simone;Braganca, Patrick M.;Gurney, Bruce A.
通讯作者: Gurney, Bruce A.
DOI: 10.1016/j.sna.2004.03.029
发表时间: 2004-10-04
影响因子: 4.6
作者:
Berus, T;Oszwaldowski, M;Grabowski, J
通讯作者: Grabowski, J
DOI: 10.1038/nnano.2010.172
发表时间: 2010-10-01
影响因子: 38.3
作者:
Dean, C. R.;Young, A. F.;Hone, J.
通讯作者: Hone, J.