Mapping electronic states of triple anti-parallel and symmetric zigzag grain boundaries of graphene on highly oriented pyrolytic graphite
Mapping electronic states of triple anti-parallel and symmetric zigzag grain boundaries of graphene on highly oriented pyrolytic graphite
复制标题
在高取向热解石墨上绘制石墨烯三重反平行和对称之字形晶界的电子态
DOI:
10.1016/j.cplett.2017.12.020
复制
发表时间:
2017-09
影响因子:
2.8
通讯作者:
Dou R. F.
中科院分区:
文献类型:
--
作者:
Ma J.;Li X. Y.;Yin L. J.;Wang W. X.;Sun Q.;Yang Y.;Zhang P.;Nie J. C.;Xiong C. M.;Dou R. F.
The grain boundaries (GBs) of a graphene surface were extensively studied because GBs with specific defect configurations result in the formation of new curved structures, which can be treated as new carbon allotropes. We studied the structures and electronic spectra of two periodic GBs in graphene on highly oriented pyrolytic graphite (HOPG) surfaces using scanning tunneling microscopy and spectroscopy (STM/S). Our results demonstrated that a GB consisting of dual parallel periodic dislocation cores of pentagonal-heptagonal (5-7) carbon rings gives rise to an enhanced localized state at 0.45 eV above the Dirac point in graphene surfaces, which is attributed to van Hove singularities (VHSs). Moreover, the energy positions of the localized states are varied between 0.40 and 0.47 eV depending on the site and eventually decayed to 0.36 eV. The variation of the energy positions is induced by two parallel GBs because of the higher electron density at the GB as a defect center and the lower electron away from the GB. Another periodic GB with a symmetric zigzag structural feature induced VHSs at -0.038 and 0.12 eV near the Fermi level. Moreover, intervalley scattering was observed on both these GBs. This means that carrier concentration and thus, the conductance around the periodic GBs can be significantly enhanced by localized density of states. This finding suggests that graphene with a properly embedded ordered GB is promising for improving the performance of graphene-based electronic devices.
登录
查看更多内容
影响因子:
6.7
作者:
Chuanxu Ma;Haifeng Sun;Hongjian Du;Jufeng Wang;A. Zhao;Qunxiang Li;B. Wang;J. Hou
通讯作者:
Chuanxu Ma;Haifeng Sun;Hongjian Du;Jufeng Wang;A. Zhao;Qunxiang Li;B. Wang;J. Hou
影响因子:
3.7
作者:
Carlsson, Johan M.;Ghiringhelli, Luca M.;Fasolino, Annalisa
通讯作者:
Fasolino, Annalisa
影响因子:
10.8
作者:
Rasool, Haider I.;Ophus, Colin;Zettl, Alex
通讯作者:
Zettl, Alex
影响因子:
3.3
作者:
Biro, Laszlo P.;Lambin, Philippe
通讯作者:
Lambin, Philippe
影响因子:
10.9
作者:
Zhang, Junfeng;Zhao, Jijun
通讯作者:
Zhao, Jijun